Issued Patents All Time
Showing 1–2 of 2 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 10712677 | Projection exposure system for semiconductor lithography, comprising elements for plasma conditioning | Irene Ament, Dirk Heinrich Ehm, Stefan Schmidt, Moritz Becker, Stefan Wiesner | 2020-07-14 |
| 10649340 | Reflective optical element for EUV lithography | Dirk Heinrich Ehm, Vitaliy Shklover, Irene Ament, Stefan Schmidt, Moritz Becker +6 more | 2020-05-12 |