MK

Maarten Van Kampen

AB Asml Netherlands B.V.: 9 patents #513 of 3,192Top 20%
CG Carl Zeiss Smt Gmbh: 1 patents #657 of 1,189Top 60%
Overall (All Time): #547,340 of 4,157,543Top 15%
9
Patents All Time

Issued Patents All Time

Showing 1–9 of 9 patents

Patent #TitleCo-InventorsDate
12055478 Apparatus and method for cleaning an inspection system Andrey Nikipelov, Saeedeh Farokhipoor 2024-08-06
10481510 Graphene spectral purity filter Andrei Mikhailovich Yakunin, Vadim Yevgenyevich Banine, Erik Roelof Loopstra, Harmen Klaas Van Der Schoot, Lucas Henricus Johannes Stevens 2019-11-19
10359710 Radiation system and optical device Hendrikus Gijsbertus Schimmel, Jeroen Huijbregtse, Pieter-Jan Van Zwol 2019-07-23
9989844 Pellicle for reticle and multilayer mirror Andrei Mikhailovich Yakunin, Vadim Yevgenyevich Banine, Erik Roelof Loopstra, Harmen Klaas Van Der Schoot, Lucas Henricus Johannes Stevens 2018-06-05
9773578 Radiation source-collector and method for manufacture Alexey Sergeevich Kuznetsov, Arjen Boogaard, Jeroen Huijbregtse, Andrey Nikipelov 2017-09-26
9606445 Lithographic apparatus and method of manufacturing a device Vadim Yevgenyevich Banine, Arthur Winfried Eduardus Minnaert, Marcel Johannus Elisabeth Hubertus Muitjens, Andrei Mikhailovich Yakunin, Luigi Scaccabarozzi +8 more 2017-03-28
9482960 Pellicle for reticle and multilayer mirror Andrei Mikhailovich Yakunin, Vadim Yevgenyevich Banine, Erik Roelof Loopstra, Harmen Klaas Van Der Schoot, Lucas Henricus Johannes Stevens 2016-11-01
9395630 Lithographic apparatus and method Andrei Mikhailovich Yakunin, Vadim Yevgenyevich Banine, Erik Roelof Loopstra, Harmen Klaas Van Der Schoot, Lucas Henricus Johannes Stevens 2016-07-19
9354529 Arrangement for use in a projection exposure tool for microlithography having a reflective optical element Dirk Heinrich Ehm, Stefan Schmidt, Vadim Yevgenyevich Banine, Erik Roelof Loopstra 2016-05-31