Issued Patents All Time
Showing 26–50 of 127 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 10288894 | Optical component for use in a radiation source module of a projection exposure system | Michael Patra, Alexander Wolf, Markus Schwab, Joachim Hartjes | 2019-05-14 |
| 10281824 | Microlithography projection objective | Heiko Feldmann, Daniel Kraehmer, Jean-Claude Perrin, Julian Kaller, Aurelian Dodoc +4 more | 2019-05-07 |
| 10261425 | Projection exposure apparatus with a highly flexible manipulator | Alexander Wolf, Boris Bittner, Norbert Wabra | 2019-04-16 |
| 10162270 | Projection exposure apparatus comprising a measuring system for measuring an optical element | Sascha Bleidistel, Joachim Hartjes | 2018-12-25 |
| 10162267 | Projection exposure apparatus including mechanism to reduce influence of pressure fluctuations | Sascha Bleidistel, Alexander Wolf, Joachim Hartjes, Markus Schwab, Markus Hauf | 2018-12-25 |
| 10146137 | Catadioptric projection objective including a reflective optical component and a measuring device | Sascha Bleidistel, Christoph Zaczek, Ralf Mueller | 2018-12-04 |
| 10120176 | Catadioptric projection objective comprising deflection mirrors and projection exposure method | Thomas Schicketanz | 2018-11-06 |
| 10067424 | Illumination intensity correction device for predefining an illumination intensity over an illumination field of a lithographic projection exposure apparatus | Martin Endres | 2018-09-04 |
| 10048592 | Projection lens, projection exposure apparatus and projection exposure method for EUV microlithography | Stephan Andre, Daniel Golde, Johannes Ruoff, Norbert Wabra, Ricarda Schoemer +1 more | 2018-08-14 |
| 10042146 | Catadioptric projection objective | Alexander Epple, Vladimir Kamenov, Thomas Schicketanz | 2018-08-07 |
| 10012911 | Projection exposure apparatus with wavefront measuring device and optical wavefront manipulator | Michael Arnz, Sascha Bleidistel, Joachim Hartjes, Markus Schwab | 2018-07-03 |
| 10001631 | Projection lens for EUV microlithography, film element and method for producing a projection lens comprising a film element | Boris Bittner, Norbert Wabra, Sonja Schneider, Ricarda Schoemer, Hendrik Wagner +6 more | 2018-06-19 |
| 9946161 | Optical system for a microlithographic projection exposure apparatus and microlithographic exposure method | Ingo Saenger, Ralf Scharnweber, Olaf Dittmann, Gundula Weiss, Andras G. Major +5 more | 2018-04-17 |
| 9933710 | Projection exposure method and projection exposure apparatus | Stephan Andre, Daniel Golde, Johannes Ruoff | 2018-04-03 |
| 9817220 | Catadioptric projection objective comprising deflection mirrors and projection exposure method | Thomas Schicketanz | 2017-11-14 |
| 9785054 | Mirror, more particularly for a microlithographic projection exposure apparatus | Kerstin Hild | 2017-10-10 |
| 9759550 | Projection exposure apparatus for microlithography comprising an optical distance measurement system | Alexander Wolf, Markus Schwab, Joachim Hartjes | 2017-09-12 |
| 9733395 | Microlithographic projection exposure apparatus | Vladimir Kamenov, Daniel Kraehmer, Karl-Stefan Weissenrieder, Heiko Feldmann, Achim Zirkel +3 more | 2017-08-15 |
| 9726870 | Catadioptric projection objective | Alexander Epple, Vladimir Kamenov, Thomas Schicketanz | 2017-08-08 |
| 9696631 | Method for stress-adjusted operation of a projection exposure system and corresponding projection exposure system | Bernhard Kneer, Markus Deguenther | 2017-07-04 |
| 9684251 | Microlithographic projection exposure apparatus and method of correcting optical wavefront deformations in such an apparatus | Joerg Holzmann, Robert Weiss | 2017-06-20 |
| 9671703 | Optical arrangement, EUV lithography apparatus and method for configuring an optical arrangement | Norman Baer, Ulrich Loering | 2017-06-06 |
| 9665006 | Projection exposure method and projection exposure apparatus for microlithography | Volker Graeschus | 2017-05-30 |
| 9581813 | Method for improving the imaging properties of a projection objective, and such a projection objective | Olaf Conradi, Heiko Feldmann, Gerald Richter, Sascha Bleidistel, Andreas Frommeyer +1 more | 2017-02-28 |
| 9459435 | Catadioptric projection objective comprising deflection mirrors and projection exposure method | Thomas Schicketanz | 2016-10-04 |