Issued Patents All Time
Showing 1–9 of 9 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 10303063 | Projection exposure apparatus with at least one manipulator | Boris Bittner, Norbert Wabra | 2019-05-28 |
| 10018907 | Method of operating a microlithographic projection apparatus | Boris Bittner, Norbert Wabra, Sonja Schneider, Ricarda Schoemer | 2018-07-10 |
| 9829800 | System correction from long timescales | Boris Bittner, Norbert Wabra, Sonja Schneider, Ricarda Schoemer, Ruediger Mack | 2017-11-28 |
| 9817316 | Projection exposure method and projection exposure apparatus for microlithography | Boris Bittner, Norbert Wabra, Sonja Schneider | 2017-11-14 |
| 9606446 | Reflective optical element for EUV lithography and method of manufacturing a reflective optical element | Norbert Wabra, Boris Bittner, Hartmut Enkisch, Stephan Muellender, Olaf Conradi | 2017-03-28 |
| 9372411 | Projection objective of a microlithographic projection exposure apparatus | Johannes Zellner, Boris Bittner, Norbert Wabra, Sonja Schneider, Ricarda Schoemer +4 more | 2016-06-21 |
| 9348234 | Microlithographic apparatus | Boris Bittner, Norbert Wabra, Sonja Schneider, Ricarda Schoemer, Hendrik Wagner +1 more | 2016-05-24 |
| 9170497 | Projection exposure apparatus with at least one manipulator | Boris Bittner, Norbert Wabra | 2015-10-27 |
| 9134613 | Illumination and displacement device for a projection exposure apparatus | Sonja Schneider, Norbert Wabra, Boris Bittner, Ricarda Schneider | 2015-09-15 |