Issued Patents All Time
Showing 26–40 of 40 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 9377694 | Projection arrangement | Rolf Freimann | 2016-06-28 |
| 9372411 | Projection objective of a microlithographic projection exposure apparatus | Johannes Zellner, Norbert Wabra, Martin von Hodenberg, Sonja Schneider, Ricarda Schoemer +4 more | 2016-06-21 |
| 9354524 | Projection exposure apparatus with optimized adjustment possibility | Holger Walter, Matthias Roesch | 2016-05-31 |
| 9348234 | Microlithographic apparatus | Norbert Wabra, Sonja Schneider, Ricarda Schoemer, Martin von Hodenberg, Hendrik Wagner +1 more | 2016-05-24 |
| 9235143 | Microlithographic projection exposure apparatus | Norbert Wabra | 2016-01-12 |
| 9170497 | Projection exposure apparatus with at least one manipulator | Norbert Wabra, Martin von Hodenberg | 2015-10-27 |
| 9164402 | Method of operating a microlithographic projection exposure apparatus and projection objective of such an apparatus | Holger Walter | 2015-10-20 |
| 9134613 | Illumination and displacement device for a projection exposure apparatus | Sonja Schneider, Norbert Wabra, Martin von Hodenberg, Ricarda Schneider | 2015-09-15 |
| 9052609 | Projection exposure apparatus with optimized adjustment possibility | Holger Walter, Matthias Roesch | 2015-06-09 |
| 8659744 | Method for correcting a lithography projection objective, and such a projection objective | Wilhelm Ulrich, Thomas Okon, Norbert Wabra, Toralf Gruner, Volker Graeschus | 2014-02-25 |
| 8605253 | Lithographic projection objective | Olaf Rogalsky, Thomas Petasch, Jochen Haeussler | 2013-12-10 |
| 8203696 | Projection exposure apparatus with optimized adjustment possibility | Holger Walter, Matthias Roesch | 2012-06-19 |
| 8174676 | Method for correcting a lithography projection objective, and such a projection objective | Wilhelm Ulrich, Thomas Okon, Norbert Wabra, Toralf Gruner, Volker Graeschus | 2012-05-08 |
| 7990622 | Projection objective of a microlithographic projection exposure apparatus | Olaf Conradi, Sascha Bleidistel, Markus Hauf, Wolfgang Hummel, Arif Kazi +4 more | 2011-08-02 |
| 7830611 | Projection objective of a microlithographic projection exposure apparatus | Olaf Conradi, Sascha Bleidistel, Markus Hauf, Wolfgang Hummel, Arif Kazi +4 more | 2010-11-09 |