Issued Patents All Time
Showing 1–13 of 13 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 9910193 | Reflective optical element and EUV lithography appliance | Hans-Juergen Mann, Udo Nothelfer | 2018-03-06 |
| 8966830 | Safety device | — | 2015-03-03 |
| 8944615 | Projection objective and method for its manufacture | Hans-Juergen Mann, Stephan Muellender, Harmut Enkisch | 2015-02-03 |
| 8891163 | Reflective optical element and EUV lithography appliance | Hans-Juergen Mann, Udo Nothelfer | 2014-11-18 |
| 8537460 | Reflective optical element and EUV lithography appliance | Hans-Jurgen Mann, Udo Nothelfer | 2013-09-17 |
| 8243364 | Reflective optical element and EUV lithography appliance | Hans-Juergen Mann, Udo Nothelfer | 2012-08-14 |
| 8228483 | Projection objective for microlithography, projection exposure apparatus, projection exposure method and optical correction plate | Ulrich Loering, Gerd Reisinger, Franz-Josef Stickel, Sonja Schneider, Stefan Kraus +2 more | 2012-07-24 |
| 8164077 | Optical element for radiation in the EUV and/or soft X-ray region and an optical system with at least one optical element | Marco Wedowski, Markus Weiss, Stephan Muellender, Hartmut Enkisch, Gisela Sipos +3 more | 2012-04-24 |
| 7952797 | Reflective optical element and EUV lithography appliance | Hans-Jurgen Mann, Udo Nothelfer | 2011-05-31 |
| 7646004 | Optical element for radiation in the EUV and/or soft X-ray region and an optical system with at least one optical element | Marco Wedowski, Markus Weiss, Stephan Müllender, Hartmut Enkisch, Gisela Sipos +3 more | 2010-01-12 |
| 7629055 | Protective coating system for reflective optical elements, reflective optical element and method for the production thereof | — | 2009-12-08 |
| 7429116 | Projection objective and method for its manufacture | Hans-Juergen Mann, Stephan Muellender, Hartmut Enkisch | 2008-09-30 |
| 7116394 | Method for cleaning a surface of a component of a lithographic projection apparatus, lithographic projection apparatus, device manufacturing method and cleaning system | Levinus Pieter Bakker, Ralph Kurt, Bastiaan Mertens, Markus Weiss, Wolfgang Singer | 2006-10-03 |