Issued Patents All Time
Showing 1–5 of 5 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 12406777 | Optical element for a EUV projection exposure system | Hartmut Enkisch, Sandro Hoffmann, Joern WEBER, Sebastian Strobel, Mirko Ribow +2 more | 2025-09-02 |
| 11099484 | Method for repairing reflective optical elements for EUV lithography | Robert Meier, Holger Kierey, Christof Jalics, Eric Eva, Ralf Winter +4 more | 2021-08-24 |
| 11073766 | Reflective optical element and optical system for EUV lithography having proportions of substances which differ across a surface | — | 2021-07-27 |
| 10598921 | Mirror element, in particular for a microlithographic projection exposure apparatus | Hartmut Enkisch, Martin Hermann | 2020-03-24 |
| 8377243 | Method for transferring a nanolayer | Armin Gölzhäuser, André Beyer | 2013-02-19 |