Issued Patents All Time
Showing 26–46 of 46 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 7355678 | Projection system for EUV lithography | Russell Hudyma, Hans-Jurgen Mann | 2008-04-08 |
| 7348565 | Illumination system particularly for microlithography | Hans-Juergen Mann, Wolfgang Singer, Joerg Schultz, Johannes Wangler, Karl-Heinz Schuster +2 more | 2008-03-25 |
| 7186983 | Illumination system particularly for microlithography | Hans-Juergen Mann, Wolfgang Singer, Joerg Schultz, Johannes Wangler, Karl-Heinz Schuster +2 more | 2007-03-06 |
| 7151592 | Projection system for EUV lithography | Russell Hudyma, Hans-Jurgen Mann | 2006-12-19 |
| 7118449 | Method of manufacturing an optical element | Frank Eisert, Siegfried Stacklies, Martin Weiser, Guenther Seitz | 2006-10-10 |
| 7077533 | Reflecting device for electromagnetic waves | Martin Weiser, Siegfried Stacklies, Markus Haidl | 2006-07-18 |
| 7031428 | Substrate material for X-ray optical components | Frank Eisert, Martin Weiser, Konrad Knapp, Ina Mitra, Hans Morian | 2006-04-18 |
| 7006595 | Illumination system particularly for microlithography | Wolfgang Singer, Jorg Schultz, Johannes Wangler, Karl-Heinz Schuster, Martin Antoni +2 more | 2006-02-28 |
| 6985210 | Projection system for EUV lithography | Russell Hudyma, Hans-Jurgen Mann | 2006-01-10 |
| 6902283 | Microlithography reduction objective and projection exposure apparatus | — | 2005-06-07 |
| 6867913 | 6-mirror microlithography projection objective | Hans-Jurgen Mann, Michael Mühlbeyer | 2005-03-15 |
| 6859328 | Illumination system particularly for microlithography | Jorg Schultz, Johannes Wangler, Karl-Hein Schuster, Wolfgang Singer, Martin Antoni +2 more | 2005-02-22 |
| 6700952 | Optical apparatus for diffracting radiation having wavelength ≦160 nm | Martin Ross-Messemer | 2004-03-02 |
| 6600552 | Microlithography reduction objective and projection exposure apparatus | — | 2003-07-29 |
| 6577443 | Reduction objective for extreme ultraviolet lithography | Hans-Jurgen Mann | 2003-06-10 |
| 6495839 | Microlithography projection objective and projection exposure apparatus | — | 2002-12-17 |
| 6438199 | Illumination system particularly for microlithography | Jorg Schultz, Johannes Wangler, Karl-Heinz Schuster, Wolfgang Singer, Martin Antoni | 2002-08-20 |
| 6353470 | Microlithography reduction objective and projection exposure apparatus | — | 2002-03-05 |
| 6244717 | Reduction objective for extreme ultraviolet lithography | — | 2001-06-12 |
| 6198793 | Illumination system particularly for EUV lithography | Jorg Schultz, Johannes Wangler, Karl-Heinz Schuster | 2001-03-06 |
| 5982558 | REMA objective for microlithographic projection exposure systems | Gerd Furter, Johannes Wangler, Gerhard Ittner | 1999-11-09 |