ML

Michael Layh

CG Carl Zeiss Smt Gmbh: 32 patents #34 of 1,189Top 3%
📍 Altusried, DE: #1 of 35 inventorsTop 3%
Overall (All Time): #104,963 of 4,157,543Top 3%
33
Patents All Time

Issued Patents All Time

Showing 26–33 of 33 patents

Patent #TitleCo-InventorsDate
8724086 Microlithographic projection exposure apparatus having a multi-mirror array with temporal stabilisation Markus Deguenther, Michael Patra, Johannes Wangler, Manfred Maul, Damian Fiolka +1 more 2014-05-13
8705005 Microlithographic illumination system Markus Deguenther, Michael Gerhard, Bruno Thome, Wolfgang Singer 2014-04-22
8537335 Illumination system for a microlithography projection exposure apparatus, microlithography projection exposure apparatus comprising such an illumination system, and fourier optical system Markus Schwab, Markus Deguenther, Artur Hoegele 2013-09-17
8520307 Optical integrator for an illumination system of a microlithographic projection exposure apparatus Oliver Wolf, Heiko Siekmann, Eva Kalchbrenner, Siegfried Rennon, Johannes Wangler +6 more 2013-08-27
8467031 Illumination system for illuminating a mask in a microlithographic exposure apparatus Erich Schubert, Alexander Kohl, Gerhard-Wilhelm Ziegler, Michael Patra, Markus Deguenther 2013-06-18
8395756 Illumination system for a microlithographic projection exposure apparatus Johannes Wangler, Heiko Siekmann, Kenneth Weible, Ralf Scharnweber, Manfred Maul +4 more 2013-03-12
8339577 Method and device for monitoring multiple mirror arrays in an illumination system of a microlithographic projection exposure apparatus Stefan Xalter, Yim-Bun Patrick Kwan, Andras G. Major, Manfred Maul, Johannes Eisenmenger +6 more 2012-12-25
7880969 Optical integrator for an illumination system of a microlithographic projection exposure apparatus Oliver Wolf, Heiko Siekmann, Eva Kalchbrenner, Siegfried Rennon, Johannes Wangler +6 more 2011-02-01