Issued Patents All Time
Showing 26–50 of 110 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 7495840 | Very high-aperture projection objective | — | 2009-02-24 |
| 7473907 | Illumination system for a wavelength of ≦ 193 nm, with sensors for determining an illumination | Wolfgang Singer, Martin Antoni, Johannes Wangler, Markus Weiss, Vadim Yevgenyevich Banine +5 more | 2009-01-06 |
| 7474469 | Arrangement of optical elements in a microlithographic projection exposure apparatus | Michael Totzeck, Gerhart Fuerter, Olaf Dittmann, David Shafer, Susanne Beder +1 more | 2009-01-06 |
| 7466489 | Projection objective having a high aperture and a planar end surface | Susanne Beder, Wolfgang Singer | 2008-12-16 |
| 7460206 | Projection objective for immersion lithography | Patrick Scheible, Alexander Hirnet, Alexandra Pazidis, Christoph Zaczek, Michael Lill +5 more | 2008-12-02 |
| 7456408 | Illumination system particularly for microlithography | Hans-Juergen Mann, Wolfgang Singer, Joerg Schultz, Johannes Wangler, Udo Dinger +2 more | 2008-11-25 |
| 7446951 | Imaging system, in particular a projection objective of a microlithographic projection exposure apparatus | — | 2008-11-04 |
| 7442908 | Method for optically detecting deviations of an image plane of an imaging system from the surface of a substrate | — | 2008-10-28 |
| 7443948 | Illumination system particularly for microlithography | Jorg Schultz, Johannes Wangler, Udo Dinger, Wolfgang Singer, Martin Antoni +2 more | 2008-10-28 |
| 7428105 | Objectives as a microlithography projection objective with at least one liquid lens | David Shafer, Susanne Beder, Wolfgang Singer | 2008-09-23 |
| 7411656 | Optically polarizing retardation arrangement, and a microlithography projection exposure machine | Michael Totzeck, Birgit Enkisch | 2008-08-12 |
| 7385764 | Objectives as a microlithography projection objective with at least one liquid lens | David Shafer, Susanne Beder, Wolfgang Singer | 2008-06-10 |
| 7382540 | Refractive projection objective | Hans-Juergen Rostalski, Russell Hudyma, Wilhelm Ulrich, Rolf Freimann | 2008-06-03 |
| 7375897 | Imaging systems | — | 2008-05-20 |
| 7372634 | Reticle-masking objective with aspherical lenses | Johannes Wangler, Alexander Sohmer, Alexander Epple, Jorg Schultz, Jurgen Grunwald | 2008-05-13 |
| 7362514 | Imaging system, in particular a projection objective of a microlithographic projection exposure apparatus | — | 2008-04-22 |
| 7348565 | Illumination system particularly for microlithography | Hans-Juergen Mann, Wolfgang Singer, Joerg Schultz, Johannes Wangler, Udo Dinger +2 more | 2008-03-25 |
| 7339743 | Very-high aperture projection objective | — | 2008-03-04 |
| 7289222 | Interferometer apparatus and method of processing a substrate having an optical surface | — | 2007-10-30 |
| 7289279 | Lithographic objective having a first lens group including only lenses having a positive refractive power | Alexander Epple | 2007-10-30 |
| 7286284 | Microscope imaging system and method for emulating a high aperture imaging system, particularly for mask inspection | Michael Totzeck, Heiko Feldmann, Toralf Gruner, Joern Greif-Wuestenbecker, Thomas Scheruebl +3 more | 2007-10-23 |
| 7277231 | Projection objective of a microlithographic exposure apparatus | Hans-Juergen Rostalski, Aurelian Dodoc | 2007-10-02 |
| 7203008 | Very high-aperture projection objective | — | 2007-04-10 |
| 7203007 | Projection exposure machine comprising a projection lens | — | 2007-04-10 |
| 7190527 | Refractive projection objective | Hans-Juergen Rostalski, Russell Hudyma, Wilhelm Ulrich, Rolf Freimann | 2007-03-13 |