Issued Patents All Time
Showing 51–68 of 68 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 7672047 | Catadioptric projection objective | David Shafer, Wilhelm Ulrich, Rudolf Von Buenau, Hans-Juergen Mann, Alexander Epple | 2010-03-02 |
| 7570343 | Microlithographic projection exposure apparatus | Karl-Heinz Schuster, Joerg Mallmann, Wilhelm Ulrich, Hans-Juergen Rostalski, Hubert Holderer +6 more | 2009-08-04 |
| 7557996 | Projection objective | — | 2009-07-07 |
| 7551361 | Lithography lens system and projection exposure system provided with at least one lithography lens system of this type | Hans-Juergen Rostalski, Alexander Epple, Johannes Wangler, Karl-Heinz Schuster, Joerg Schultz +3 more | 2009-06-23 |
| 7532306 | Microlithographic projection exposure apparatus | Karl-Heinz Schuster, Joerg Mallmann, Wilhelm Ulrich, Hans-Juergen Rostalski | 2009-05-12 |
| 7492509 | Projection optical system | Hans-Juergen Rostalski, Wilhelm Ulrich, Alexander Epple | 2009-02-17 |
| 7463422 | Projection exposure apparatus | Vladimir Kamenow, Daniel Kraehmer, Michael Totzeck, Toralf Gruner, David Shafer +4 more | 2008-12-09 |
| 7426082 | Catadioptric projection objective with geometric beam splitting | David Shafer, Alexander Epple, Helmut Beierl, Wilhelm Ulrich | 2008-09-16 |
| 7411201 | Projection objective for a microlithographic projection exposure apparatus | Hans-Juergen Rostalski | 2008-08-12 |
| 7408716 | Refractive projection objective for immersion lithography | Hans-Juergen Rostalski, Alexander Epple, Helmut Beierl | 2008-08-05 |
| 7385756 | Catadioptric projection objective | David Shafer, Wilhelm Ulrich, Rudolf Von Buenau, Hans-Juergen Mann, Alexander Epple | 2008-06-10 |
| 7359036 | Imaging system, in particular for a microlithographic projection exposure apparatus | — | 2008-04-15 |
| 7277231 | Projection objective of a microlithographic exposure apparatus | Karl-Heinz Schuster, Hans-Juergen Rostalski | 2007-10-02 |
| 7239450 | Method of determining lens materials for a projection exposure apparatus | Vladimir Kamenov, Daniel Kraehmer, Michael Totzeck, Toralf Gruner | 2007-07-03 |
| 7203010 | Catadioptric projection objective | Alexander Epple | 2007-04-10 |
| 7187503 | Refractive projection objective for immersion lithography | Hans-Juergen Rostalski, Alexander Epple, Helmut Beierl | 2007-03-06 |
| 7136220 | Catadioptric reduction lens | Wilhelm Ulrich, David Shafer, Alexander Epple, Helmut Beierl | 2006-11-14 |
| 6995930 | Catadioptric projection objective with geometric beam splitting | David Shafer, Alexander Epple, Helmut Beierl, Wilhelm Ulrich | 2006-02-07 |