Issued Patents All Time
Showing 25 most recent of 31 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 12190500 | Detecting defects on specimens | Chunwei Song, Siqing Nie, Weifeng Zhou, Xiaochun Li | 2025-01-07 |
| 12056867 | Image contrast metrics for deriving and improving imaging conditions | Bjorn Brauer, Hucheng Lee | 2024-08-06 |
| 11921052 | Inspection with previous step subtraction | Robert M. Danen, Dmitri Starodub, Abdurrahman Sezginer | 2024-03-05 |
| 11803960 | Optical image contrast metric for optical target search | Huan Jin, Xiaochun Li, Zhifeng Huang | 2023-10-31 |
| 11783470 | Design-assisted inspection for DRAM and 3D NAND devices | Junqing Huang, Hucheng Lee, Xiaochun Li | 2023-10-10 |
| 11776108 | Deep learning based defect detection | Richard Wallingford, Ge Cong | 2023-10-03 |
| 11748872 | Setting up inspection of a specimen | Hong Chen, Bjorn Brauer, Abdurrahman Sezginer, Ge Cong, Xiaochun Li | 2023-09-05 |
| 11619592 | Selecting defect detection methods for inspection of a specimen | Bjorn Brauer, Hucheng Lee | 2023-04-04 |
| 11615993 | Clustering sub-care areas based on noise characteristics | Boshi Huang, Hucheng Lee, Vladimir Tumakov, Bjorn Brauer, Erfan Soltanmohammadi | 2023-03-28 |
| 11416982 | Controlling a process for inspection of a specimen | Bjorn Brauer, Hucheng Lee | 2022-08-16 |
| 11308606 | Design-assisted inspection for DRAM and 3D NAND devices | Junqing Huang, Hucheng Lee, Xiaochun Li | 2022-04-19 |
| 11120546 | Unsupervised learning-based reference selection for enhanced defect inspection sensitivity | Bjorn Brauer, Nurmohammed Patwary, Xiaochun Li | 2021-09-14 |
| 11049745 | Defect-location determination using correction loop for pixel alignment | David Dowling, Tarunark Singh, Bjorn Brauer, Santosh Bhattacharyya, Bryant Mantiply +2 more | 2021-06-29 |
| 11010885 | Optical-mode selection for multi-mode semiconductor inspection | Bjorn Brauer, Richard Wallingford, Kedar Grama, Hucheng Lee | 2021-05-18 |
| 10489902 | Inspection apparatus, semiconductor device manufacturing system including the same, and method of manufacturing a semiconductor device using the same | Kwang Soo Kim, Byeonghwan Jeon, Youngduk Kim | 2019-11-26 |
| 10474133 | Inspection device for inspecting wafer and method of inspecting wafer using the same | Janghee Lee, Yoo-jin Jeong, Byeonghwan Jeon | 2019-11-12 |
| 10199282 | Inspection apparatus and method of manufacturing semiconductor device using the same | Sung Won Park, Jeong-Su HA, Kwang Soo Kim, Byeong Kyu Cha | 2019-02-05 |
| 9412673 | Multi-model metrology | In-Kyo Kim, Xin Li, Leonid Poslavsky, Liequan Lee, Meng Cao +2 more | 2016-08-09 |
| 8937601 | Method and apparatus of recognizing gesture with untouched way | Hoh Peter In, Jungyeon Kim, Do Hoon Kim | 2015-01-20 |
| 8632930 | Method and apparatus for performing dark field double dipole lithography (DDL) | Duan-Fu Stephen Hsu, Douglas Van Den Broeke, Jang Fung Chen | 2014-01-21 |
| 8120753 | Method, program product and apparatus for generating a calibrated pupil kernel and method of using the same in a lithography simulation process | Gabriel Berger, Tamer Coskun, Jang Fung Chen | 2012-02-21 |
| 7981576 | Method and apparatus for performing dark field double dipole lithography (DDL) | Duan-Fu Stephen Hsu, Douglas Van Den Broeke, Jang Fung Chen | 2011-07-19 |
| 7824826 | Method and apparatus for performing dark field double dipole lithography (DDL) | Duan-Fu Stephen Hsu, Douglas Van Den Broeke, Jang Fung Chen | 2010-11-02 |
| 7818151 | Method, program product and apparatus for obtaining short-range flare model parameters for lithography simulation tool | Tamer Coskun, Jang Fung Chen, Bernd Geh | 2010-10-19 |
| 7652758 | Method of performing resist process calibration/optimization and DOE optimization for providing OPE matching between different lithography systems | Jang Fung Chen, Armin Liebchen | 2010-01-26 |