Issued Patents All Time
Showing 1–25 of 108 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 12353970 | Finding semiconductor defects using convolutional context attributes | Gordon Rouse, Manikandan Mariyappan | 2025-07-08 |
| 12094101 | Inspection of reticles using machine learning | Hawren Fang, Rui-fang Shi | 2024-09-17 |
| 11921052 | Inspection with previous step subtraction | Robert M. Danen, Sangbong Park, Dmitri Starodub | 2024-03-05 |
| 11748872 | Setting up inspection of a specimen | Hong Chen, Bjorn Brauer, Sangbong Park, Ge Cong, Xiaochun Li | 2023-09-05 |
| 11410830 | Defect inspection and review using transmissive current image of charged particle beam system | Hong Xiao, Lawrence P. Muray, Nick Petrone, John Gerling, Alan D. Brodie +3 more | 2022-08-09 |
| 11270430 | Wafer inspection using difference images | Xiaochun Li, Pavan Kumar, Junqing Huang, Lisheng Gao, Grace Hsiu-Ling Chen +2 more | 2022-03-08 |
| 11257207 | Inspection of reticles using machine learning | Hawren Fang, Rui-fang Shi | 2022-02-22 |
| 11131629 | Apparatus and methods for measuring phase and amplitude of light through a layer | Kuljit S. Virk, Eric Vella | 2021-09-28 |
| 10761031 | Arbitrary wavefront compensator for deep ultraviolet (DUV) optical imaging system | Qiang Zhang | 2020-09-01 |
| 10539512 | Block-to-block reticle inspection | Patrick LoPresti, Joe Blecher, Rui-fang Shi, Yalin Xiong, John Fielden | 2020-01-21 |
| 10395361 | Apparatus and methods for inspecting reticles | Mohammad Mehdi Daneshpanah | 2019-08-27 |
| 10304180 | Apparatus and methods for predicting wafer-level defect printability | Rui-fang Shi | 2019-05-28 |
| 10288415 | Critical dimension uniformity monitoring for extreme ultra-violet reticles | Rui-fang Shi, Alex Pokrovskiy, Weston L. Sousa | 2019-05-14 |
| 9875534 | Techniques and systems for model-based critical dimension measurements | Eric Vella, Balaji Ganapathy, Yanwei Liu | 2018-01-23 |
| 9863761 | Critical dimension uniformity monitoring for extreme ultraviolet reticles | Rui-fang Shi, Alex Pokrovskiy, Weston L. Sousa | 2018-01-09 |
| 9805462 | Machine learning method and apparatus for inspecting reticles | Gang Pan, Bing Li | 2017-10-31 |
| 9766185 | Block-to-block reticle inspection | Patrick LoPresti, Joe Blecher, Rui-fang Shi, Yalin Xiong, John Fielden | 2017-09-19 |
| 9652843 | Machine learning method and apparatus for inspecting reticles | Gang Pan, Bing Li | 2017-05-16 |
| 9547892 | Apparatus and methods for predicting wafer-level defect printability | Rui-fang Shi | 2017-01-17 |
| 9494535 | Scatterometry-based imaging and critical dimension metrology | John J. Hench, Michael S. Bakeman | 2016-11-15 |
| 9478019 | Reticle inspection using near-field recovery | Rui-fang Shi | 2016-10-25 |
| 9430824 | Machine learning method and apparatus for inspecting reticles | Gang Pan, Bing Li | 2016-08-30 |
| 9335206 | Wave front aberration metrology of optics of EUV mask inspection system | Qiang Zhang, Yanwei Liu | 2016-05-10 |
| 9311700 | Model-based registration and critical dimension metrology | Mohammad Mehdi Daneshpanah | 2016-04-12 |
| 9292627 | System and method for modifying a data set of a photomask | Dipankar Pramanik, Michiel Victor Paul Kruger, Roy Prasad | 2016-03-22 |