Issued Patents All Time
Showing 1–25 of 45 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 12298254 | System and method for reducing sample noise using selective markers | Kuljit S. Virk, Martin Gruebele | 2025-05-13 |
| 12203857 | Multi-element super resolution optical inspection system | — | 2025-01-21 |
| 12140550 | Selective marking of a substrate with fluorescent conjugated polymer probes having a small form factor | Jinsang Kim | 2024-11-12 |
| 11760853 | Anti-curling film | Wei-Hong Chang, Ching-Mei Chen, Hsin-Hsin Shen, Yuchi WANG, Ming-Chia Yang +5 more | 2023-09-19 |
| 11715622 | Material recovery systems for optical components | Gildardo Delgado, Vera (Guorong) Zhuang, John Savee, Evgeniia Butaeva, Gary V. Lopez Lopez | 2023-08-01 |
| 11668655 | Multimode defect classification in semiconductor inspection | Vaibhav Gaind, Amrit Poudel, Mark Wang | 2023-06-06 |
| 11410830 | Defect inspection and review using transmissive current image of charged particle beam system | Hong Xiao, Lawrence P. Muray, Nick Petrone, John Gerling, Abdurrahman Sezginer +3 more | 2022-08-09 |
| 11302511 | Field curvature correction for multi-beam inspection systems | Alan D. Brodie, Rainer Knippelmeyer, Christopher Sears, John Rouse | 2022-04-12 |
| 11270430 | Wafer inspection using difference images | Abdurrahman Sezginer, Xiaochun Li, Pavan Kumar, Junqing Huang, Lisheng Gao +2 more | 2022-03-08 |
| 11120969 | Method and system for charged particle microscopy with improved image beam stabilization and interrogation | Doug K. Masnaghetti, Gabor Toth, David Trease, Rohit Bothra, Rainer Knippelmeyer | 2021-09-14 |
| 10921262 | Correlating SEM and optical images for wafer noise nuisance identification | Qiang Zhang | 2021-02-16 |
| 10697900 | Correlating SEM and optical images for wafer noise nuisance identification | Qiang Zhang | 2020-06-30 |
| 10648924 | Generating high resolution images from low resolution images for semiconductor applications | Jing Zhang, Kris Bhaskar, Keith Wells, Nan BAI, Ping Gu +1 more | 2020-05-12 |
| 10643819 | Method and system for charged particle microscopy with improved image beam stabilization and interrogation | Doug K. Masnaghetti, Gabor Toth, David Trease, Rohit Bothra, Rainer Knippelmeyer | 2020-05-05 |
| 10545099 | Ultra-high sensitivity hybrid inspection with full wafer coverage capability | Lawrence P. Muray | 2020-01-28 |
| 10527568 | Counting particles using an electrical differential counter | Nicholas Watkins, Rashid Bashir, William Rodriguez, Xuanhong Cheng, Mehmet Toner +1 more | 2020-01-07 |
| 10429319 | Inspection system including parallel imaging paths with multiple and selectable spectral bands | Shiow-Hwei Hwang, Amir Bar, Daniel L. Cavan | 2019-10-01 |
| 10416087 | Systems and methods for defect detection using image reconstruction | Jing Zhang, Jeremy Nesbitt, Richard Wallingford | 2019-09-17 |
| 10215713 | Determining a configuration for an optical element positioned in a collection aperture during wafer inspection | Pavel Kolchin, Mikhail Haurylau, Junwei Wei, Dan Kapp, Robert M. Danen | 2019-02-26 |
| 10132760 | Apparatus and methods for finding a best aperture and mode to enhance defect detection | Pavel Kolchin, Richard Wallingford, Lisheng Gao, Markus Huber, Robert M. Danen | 2018-11-20 |
| 10043261 | Generating simulated output for a specimen | Kris Bhaskar, Jing Zhang, Ashok Kulkarni, Laurent Karsenti | 2018-08-07 |
| 9976973 | Counting particles using an electrical differential counter | Nicholas Watkins, Rashid Bashir, William Rodriguez, Xuanhong Cheng, Mehmet Toner +1 more | 2018-05-22 |
| 9916965 | Hybrid inspectors | Kris Bhaskar, Keith Wells, Wayne McMillan, Jing Zhang, Scott A. Young +1 more | 2018-03-13 |
| 9846930 | Detecting defects on a wafer using defect-specific and multi-channel information | Kenong Wu, Lisheng Gao, David W. Shortt | 2017-12-19 |
| 9816940 | Wafer inspection with focus volumetric method | Keith Wells, Markus Huber, Se Baek Oh | 2017-11-14 |