Issued Patents All Time
Showing 26–50 of 108 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 8782586 | Method, system, and program product for routing an integrated circuit to be manufactured by doubled patterning | David C. Noice, Jason Sweis, Vassilios Gerousis, Sozen Yao | 2014-07-15 |
| 8716135 | Method of eliminating a lithography operation | Judy Huckabay, Milind Weling | 2014-05-06 |
| 8679981 | Method for self-aligned doubled patterning lithography | Milind Weling, Judy Huckabay | 2014-03-25 |
| 8656321 | Method of eliminating a lithography operation | Judy Huckabay, Milind Weling | 2014-02-18 |
| 8572517 | System and method for modifying a data set of a photomask | Dipankar Pramanik, Michiel Victor Paul Kruger, Roy Prasad | 2013-10-29 |
| 8549458 | Method, system, and program product for routing an integrated circuit to be manufactured by sidewall-image transfer | — | 2013-10-01 |
| 8440569 | Method of eliminating a lithography operation | Milind Weling | 2013-05-14 |
| 8423928 | System and method for model based multi-patterning optimization | Justin Ghan | 2013-04-16 |
| 8279409 | System and method for calibrating a lithography model | Hsu-Ting Huang, Jesus Carrero, Tatung Chow, Kostyantyn Chuyeshov, Gokhan Percin | 2012-10-02 |
| 8122389 | Apparatus and method for segmenting edges for optical proximity correction | Bayram Yenikaya, Hsu-Ting Huang | 2012-02-21 |
| 8069423 | System and method for model based multi-patterning optimization | Justin Ghan | 2011-11-29 |
| 7913197 | Method for double patterning lithography | Michiel Victor Paul Kruger, Bayram Yenikaya, Anwei Liu, Wolf Staud | 2011-03-22 |
| 7856613 | Method for self-aligned doubled patterning lithography | Milind Weling, Judy Huckabay | 2010-12-21 |
| 7849423 | Method of verifying photomask data based on models of etch and lithography processes | Bayram Yenikaya, Devendra Joshi, Paul A. Fornari, Jesus Carrero | 2010-12-07 |
| 7743359 | Apparatus and method for photomask design | Roy Prasad, Chi-Song Horng, Hsu-Ting Huang | 2010-06-22 |
| 7743358 | Apparatus and method for segmenting edges for optical proximity correction | Bayram Yenikaya, Hsu-Ting Huang | 2010-06-22 |
| 7600212 | Method of compensating photomask data for the effects of etch and lithography processes | Franz Zach, Jesus Carrero, Bayram Yenikaya, Gokhan Percin, Xuelong Cao | 2009-10-06 |
| 7588868 | Method and system for reducing the impact of across-wafer variations on critical dimension measurements | Franz Zach, Gokhan Percin | 2009-09-15 |
| 7568174 | Method for checking printability of a lithography target | Bayram Yenikaya | 2009-07-28 |
| 7519940 | Apparatus and method for compensating a lithography projection tool | Hsu-Ting Huang | 2009-04-14 |
| 7506300 | Apparatus and method for breaking up and merging polygons | Roy Prasad | 2009-03-17 |
| 7480891 | Method and apparatus of model-based photomask synthesis | — | 2009-01-20 |
| 7471392 | Polarimetric scatterometry methods for critical dimension measurements of periodic structures | Adam E. Norton, Fred E. Stanke | 2008-12-30 |
| 7444615 | Calibration on wafer sweet spots | Gokhan Percin, Ram Ramanujam, Franz Zach, Chi-Song Horng, Roy Prasad | 2008-10-28 |
| 7379170 | Apparatus and method for characterizing an image system in lithography projection tool | Hsu-Ting Huang | 2008-05-27 |