Issued Patents All Time
Showing 1–3 of 3 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 7613598 | Global shape definition method for scatterometry | Jon Opsal, Hanyou Chu, Youxian Wen | 2009-11-03 |
| 7600212 | Method of compensating photomask data for the effects of etch and lithography processes | Franz Zach, Jesus Carrero, Bayram Yenikaya, Gokhan Percin, Abdurrahman Sezginer | 2009-10-06 |
| 7145664 | Global shape definition method for scatterometry | Jon Opsal, Hanyou Chu, Youxian Wen | 2006-12-05 |