Issued Patents All Time
Showing 1–25 of 34 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 12261030 | Normal-incidence in-situ process monitor sensor | Ching-Ling Meng, Holger Tuitje, Qiang Zhao, Xinkang Tian | 2025-03-25 |
| 11961721 | Normal-incidence in-situ process monitor sensor | Ching-Ling Meng, Holger Tuitje, Qiang Zhao, Xinkang Tian | 2024-04-16 |
| 10978278 | Normal-incident in-situ process monitor sensor | Ching-Ling Meng, Holger Tuitje, Qiang Zhao, Xinkang Tian | 2021-04-13 |
| 10837902 | Optical sensor for phase determination | Ivan Maleev, Mihail Mihaylov, Ching-Ling Meng, Qionglin Gao, Yan Chen +1 more | 2020-11-17 |
| 9970818 | Spatially resolved optical emission spectroscopy (OES) in plasma processing | Junwei Bao, Ching-Ling Meng, Holger Tuitje, Mihail Mihaylov, Yan Chen +2 more | 2018-05-15 |
| 9625937 | Computation efficiency by diffraction order truncation | Joerg Bischoff, Shifang Li, Weidong Yang | 2017-04-18 |
| 9127927 | Techniques for optimized scatterometry | Jonathan Iloreta, Paul Aoyagi, Jeffrey A. Chard, Peilin Jiang, Mikhail Sushchik +2 more | 2015-09-08 |
| 9059038 | System for in-situ film stack measurement during etching and etch control method | Shifang Li, Junwei Bao, Wen Jin, Ching-Ling Meng, Weiwen Xu +4 more | 2015-06-16 |
| 8762100 | Numerical aperture integration for optical critical dimension (OCD) metrology | Peilin Jiang, Joerg Bischoff | 2014-06-24 |
| 8670948 | Numerical aperture integration for optical critical dimension (OCD) metrology | Peilin Jiang | 2014-03-11 |
| 8560270 | Rational approximation and continued-fraction approximation approaches for computation efficiency of diffraction signals | — | 2013-10-15 |
| 8069020 | Generating simulated diffraction signal using a dispersion function relating process parameter to dispersion | Shifang Li | 2011-11-29 |
| 7912679 | Determining profile parameters of a structure formed on a semiconductor wafer using a dispersion function relating process parameter to dispersion | Shifang Li | 2011-03-22 |
| 7639351 | Automated process control using optical metrology with a photonic nanojet | Zhigang Chen, Shifang Li, Manuel Madriaga | 2009-12-29 |
| 7639375 | Determining transmittance of a photomask using optical metrology | Sanjay K. Yedur, Shifang Li, Youxian Wen, Wei Liu, Ying Ying Luo | 2009-12-29 |
| 7636649 | Automated process control of a fabrication tool using a dispersion function relating process parameter to dispersion | Shifang Li, Manuel Madriaga | 2009-12-22 |
| 7613598 | Global shape definition method for scatterometry | Jon Opsal, Xuelong Cao, Youxian Wen | 2009-11-03 |
| 7522294 | Measuring a process parameter of a semiconductor fabrication process using optical metrology | Vi Vuong, Yan Chen | 2009-04-21 |
| 7394535 | Optical metrology using a photonic nanojet | Zhigang Chen, Shifang Li | 2008-07-01 |
| 7327475 | Measuring a process parameter of a semiconductor fabrication process using optical metrology | Vi Vuong, Yan Chen | 2008-02-05 |
| 7233390 | Scatterometry for samples with non-uniform edges | Yia-Chung Chang, Jon Opsal | 2007-06-19 |
| 7145664 | Global shape definition method for scatterometry | Jon Opsal, Xuelong Cao, Youxian Wen | 2006-12-05 |
| 7106459 | CD metrology analysis using a finite difference method | — | 2006-09-12 |
| 7038850 | CD metrology analysis using green's function | Yia-Chung Chang, Jon Opsal | 2006-05-02 |
| 7031848 | Real time analysis of periodic structures on semiconductors | Jon Opsal | 2006-04-18 |