Issued Patents All Time
Showing 1–25 of 28 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 12261030 | Normal-incidence in-situ process monitor sensor | Ching-Ling Meng, Holger Tuitje, Qiang Zhao, Hanyou Chu | 2025-03-25 |
| 12165937 | Optical diagnostics of semiconductor process using hyperspectral imaging | Yan Chen | 2024-12-10 |
| 11961721 | Normal-incidence in-situ process monitor sensor | Ching-Ling Meng, Holger Tuitje, Qiang Zhao, Hanyou Chu | 2024-04-16 |
| 11763161 | Enhanced resolution in semiconductor fabrication data acquisition instruments using machine learning | Yan Chen, Zheng Yan | 2023-09-19 |
| 11692874 | Peak alignment for the wavelength calibration of a spectrometer | Yan Chen | 2023-07-04 |
| 11538723 | Optical diagnostics of semiconductor process using hyperspectral imaging | Yan Chen | 2022-12-27 |
| 11538722 | Optical diagnostics of semiconductor process using hyperspectral imaging | Yan Chen | 2022-12-27 |
| 10978278 | Normal-incident in-situ process monitor sensor | Ching-Ling Meng, Holger Tuitje, Qiang Zhao, Hanyou Chu | 2021-04-13 |
| 10910201 | Synthetic wavelengths for endpoint detection in plasma etching | Yan Chen, Vi Vuong | 2021-02-02 |
| 10837902 | Optical sensor for phase determination | Ivan Maleev, Mihail Mihaylov, Hanyou Chu, Ching-Ling Meng, Qionglin Gao +1 more | 2020-11-17 |
| 10692705 | Advanced optical sensor and method for detecting an optical event in a light emission signal in a plasma chamber | Mihail Mihaylov, Ching-Ling Meng, Jason Ferns, Joel Ng, Badru D. Hyatt +2 more | 2020-06-23 |
| 10453653 | Endpoint detection algorithm for atomic layer etching (ALE) | Yan Chen, Jason Ferns | 2019-10-22 |
| 10345246 | Dark field wafer nano-defect inspection system with a singular beam | Ching-Ling Meng, Yan Sun | 2019-07-09 |
| 9059038 | System for in-situ film stack measurement during etching and etch control method | Shifang Li, Junwei Bao, Hanyou Chu, Wen Jin, Ching-Ling Meng +4 more | 2015-06-16 |
| 8193007 | Etch process control using optical metrology and sensor devices | Manuel Madriaga | 2012-06-05 |
| 8173450 | Method of designing an etch stage measurement system | Manuel Madriaga | 2012-05-08 |
| 8173451 | Etch stage measurement system | Manuel Madriaga | 2012-05-08 |
| 8030632 | Controlling angle of incidence of multiple-beam optical metrology tools | Adam E. Norton | 2011-10-04 |
| 8030631 | Apparatus for controlling angle of incidence of multiple illumination beams | Adam E. Norton | 2011-10-04 |
| 7948630 | Auto focus of a workpiece using two or more focus parameters | Norton Adam | 2011-05-24 |
| 7761178 | Automated process control using an optical metrology system optimized with design goals | Manuel Madriaga, Ching-Ling Meng, Mihail Mihaylov | 2010-07-20 |
| 7761250 | Optical metrology system optimized with design goals | Manuel Madriaga, Ching-Ling Meng, Mihail Mihaylov | 2010-07-20 |
| 7742889 | Designing an optical metrology system optimized with signal criteria | Manuel Madriaga, Ching-Ling Meng, Mihail Mihalov | 2010-06-22 |
| 7734437 | Apparatus for designing an optical metrology system optimized with signal criteria | Manuel Madriaga, Ching-Ling Meng, Mihail Mihalov | 2010-06-08 |
| 7660696 | Apparatus for auto focusing a workpiece using two or more focus parameters | Adam E. Norton, Manuel Madriaga | 2010-02-09 |