Issued Patents All Time
Showing 1–25 of 31 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 12261030 | Normal-incidence in-situ process monitor sensor | Holger Tuitje, Qiang Zhao, Hanyou Chu, Xinkang Tian | 2025-03-25 |
| 11961721 | Normal-incidence in-situ process monitor sensor | Holger Tuitje, Qiang Zhao, Hanyou Chu, Xinkang Tian | 2024-04-16 |
| 11385154 | Apparatus and method for monitoring and measuring properties of polymers in solutions | Ivan Maleev | 2022-07-12 |
| 10978278 | Normal-incident in-situ process monitor sensor | Holger Tuitje, Qiang Zhao, Hanyou Chu, Xinkang Tian | 2021-04-13 |
| 10837902 | Optical sensor for phase determination | Ivan Maleev, Mihail Mihaylov, Hanyou Chu, Qionglin Gao, Yan Chen +1 more | 2020-11-17 |
| 10692705 | Advanced optical sensor and method for detecting an optical event in a light emission signal in a plasma chamber | Mihail Mihaylov, Xinkang Tian, Jason Ferns, Joel Ng, Badru D. Hyatt +2 more | 2020-06-23 |
| 10473525 | Spatially resolved optical emission spectroscopy (OES) in plasma processing | Holger Tuitje, Yan Chen, Mihail Mihaylov | 2019-11-12 |
| 10345246 | Dark field wafer nano-defect inspection system with a singular beam | Xinkang Tian, Yan Sun | 2019-07-09 |
| 9970818 | Spatially resolved optical emission spectroscopy (OES) in plasma processing | Junwei Bao, Holger Tuitje, Mihail Mihaylov, Yan Chen, Zheng Yan +2 more | 2018-05-15 |
| 9846088 | Differential acoustic time of flight measurement of temperature of semiconductor substrates | Jun Pei, Junwei Bao, Holger Tuitje, Mihail Mihaylov | 2017-12-19 |
| 9059038 | System for in-situ film stack measurement during etching and etch control method | Shifang Li, Junwei Bao, Hanyou Chu, Wen Jin, Weiwen Xu +4 more | 2015-06-16 |
| 8831767 | Methods and systems for monitoring a parameter of a measurement device during polishing, damage to a specimen during polishing, or a characteristic of a polishing pad or tool | Kurt Lehman, Charles Chen, Ronald L. Allen, Robert Shinagawa, Anantha R. Sethuraman +3 more | 2014-09-09 |
| 8010222 | Methods and systems for monitoring a parameter of a measurement device during polishing, damage to a specimen during polishing, or a characteristic of a polishing pad or tool | Kurt Lehman, Charles Chen, Ronald L. Allen, Robert Shinagawa, Anantha R. Sethuraman +3 more | 2011-08-30 |
| 7789541 | Method and system for lamp temperature control in optical metrology | Mihail Mihaylov | 2010-09-07 |
| 7761178 | Automated process control using an optical metrology system optimized with design goals | Xinkang Tian, Manuel Madriaga, Mihail Mihaylov | 2010-07-20 |
| 7761250 | Optical metrology system optimized with design goals | Xinkang Tian, Manuel Madriaga, Mihail Mihaylov | 2010-07-20 |
| 7742889 | Designing an optical metrology system optimized with signal criteria | Xinkang Tian, Manuel Madriaga, Mihail Mihalov | 2010-06-22 |
| 7734437 | Apparatus for designing an optical metrology system optimized with signal criteria | Xinkang Tian, Manuel Madriaga, Mihail Mihalov | 2010-06-08 |
| 7595869 | Optical metrology system optimized with a plurality of design goals | Xinkang Tian, Manuel Madriaga, Mihail Mihaylov | 2009-09-29 |
| 7589845 | Process control using an optical metrology system optimized with signal criteria | Xinkang Tian, Manuel Madriaga, Mihail Mihalov | 2009-09-15 |
| 7420681 | Gas purge system and methods | Ning Wang, Anthony Tang | 2008-09-02 |
| 7332438 | Methods and systems for monitoring a parameter of a measurement device during polishing, damage to a specimen during polishing, or a characteristic of a polishing pad or tool | Kurt Lehman, Charles Chen, Ronald L. Allen, Robert Shinagawa, Anantha R. Sethuraman +3 more | 2008-02-19 |
| 7281862 | Optical device latching mechanism | Joshua T. Oen, Daehwan Kim | 2007-10-16 |
| 7175503 | Methods and systems for determining a characteristic of polishing within a zone on a specimen from combined output signals of an eddy current device | Kurt Lehman, Charles Chen, Ronald L. Allen, Robert Shinagawa, Anantha R. Sethuraman +3 more | 2007-02-13 |
| 7052369 | Methods and systems for detecting a presence of blobs on a specimen during a polishing process | Kurt Lehman, Charles Chen, Ronald L. Allen, Robert Shinagawa, Anantha R. Sethuraman +3 more | 2006-05-30 |