Issued Patents All Time
Showing 1–13 of 13 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 9001629 | Systems and methods for suppressing background energy of a waveguide in an energy assisted magnetic recording system | Hongxing Yuan, Michael V. Morelli, Matthew R. Gibbons, Zhong Shi | 2015-04-07 |
| 8958168 | Method and system for providing an NFT having improved mechanical stability | Hongxing Yuan, Zhongyan Wang, Michael V. Morelli | 2015-02-17 |
| 8831767 | Methods and systems for monitoring a parameter of a measurement device during polishing, damage to a specimen during polishing, or a characteristic of a polishing pad or tool | Kurt Lehman, Charles Chen, Robert Shinagawa, Anantha R. Sethuraman, Christopher F. Bevis +3 more | 2014-09-09 |
| 8670294 | Systems and methods for increasing media absorption efficiency using interferometric waveguides | Zhong Shi, Shing Lee, Hongxing Yuan, Sergei Sochava, Yunfei Li +1 more | 2014-03-11 |
| 8625930 | Digital microscope slide scanning system and methods | Lokesh Tatke, Suraj Somwanshi, Bikash Sabata, Suhas Patil, Sujit Chivate | 2014-01-07 |
| 8010222 | Methods and systems for monitoring a parameter of a measurement device during polishing, damage to a specimen during polishing, or a characteristic of a polishing pad or tool | Kurt Lehman, Charles Chen, Robert Shinagawa, Anantha R. Sethuraman, Christopher F. Bevis +3 more | 2011-08-30 |
| 7332438 | Methods and systems for monitoring a parameter of a measurement device during polishing, damage to a specimen during polishing, or a characteristic of a polishing pad or tool | Kurt Lehman, Charles Chen, Robert Shinagawa, Anantha R. Sethuraman, Christopher F. Bevis +3 more | 2008-02-19 |
| 7175503 | Methods and systems for determining a characteristic of polishing within a zone on a specimen from combined output signals of an eddy current device | Kurt Lehman, Charles Chen, Robert Shinagawa, Anantha R. Sethuraman, Christopher F. Bevis +3 more | 2007-02-13 |
| 7052369 | Methods and systems for detecting a presence of blobs on a specimen during a polishing process | Kurt Lehman, Charles Chen, Robert Shinagawa, Anantha R. Sethuraman, Christopher F. Bevis +3 more | 2006-05-30 |
| 7030018 | Methods and systems for monitoring a parameter of a measurement device during polishing, damage to a specimen during polishing, or a characteristic of a polishing pad or tool | Kurt Lehman, Charles Chen, Robert Shinagawa, Anantha R. Sethuraman, Christopher F. Bevis +3 more | 2006-04-18 |
| 6935922 | Methods and systems for generating a two-dimensional map of a characteristic at relative or absolute locations of measurement spots on a specimen during polishing | Kurt Lehman, Charles Chen, Robert Shinagawa, Anantha R. Sethuraman, Christopher F. Bevis +3 more | 2005-08-30 |
| 6884146 | Systems and methods for characterizing a polishing process | Kurt Lehman, Charles Chen, Robert Shinagawa, Anantha R. Sethuraman, Christopher F. Bevis +3 more | 2005-04-26 |
| 6866559 | Windows configurable to be coupled to a process tool or to be disposed within an opening in a polishing pad | Kurt Lehman, Charles Chen, Robert Shinagawa, Anantha R. Sethuraman, Christopher F. Bevis +3 more | 2005-03-15 |