| 8831767 |
Methods and systems for monitoring a parameter of a measurement device during polishing, damage to a specimen during polishing, or a characteristic of a polishing pad or tool |
Kurt Lehman, Charles Chen, Ronald L. Allen, Anantha R. Sethuraman, Christopher F. Bevis +3 more |
2014-09-09 |
| 8010222 |
Methods and systems for monitoring a parameter of a measurement device during polishing, damage to a specimen during polishing, or a characteristic of a polishing pad or tool |
Kurt Lehman, Charles Chen, Ronald L. Allen, Anantha R. Sethuraman, Christopher F. Bevis +3 more |
2011-08-30 |
| 7332438 |
Methods and systems for monitoring a parameter of a measurement device during polishing, damage to a specimen during polishing, or a characteristic of a polishing pad or tool |
Kurt Lehman, Charles Chen, Ronald L. Allen, Anantha R. Sethuraman, Christopher F. Bevis +3 more |
2008-02-19 |
| 7230703 |
Apparatus and method for measuring overlay by diffraction gratings |
Abdurrahman Sezginer, Hsu-Ting Huang |
2007-06-12 |
| 7175503 |
Methods and systems for determining a characteristic of polishing within a zone on a specimen from combined output signals of an eddy current device |
Kurt Lehman, Charles Chen, Ronald L. Allen, Anantha R. Sethuraman, Christopher F. Bevis +3 more |
2007-02-13 |
| 7052369 |
Methods and systems for detecting a presence of blobs on a specimen during a polishing process |
Kurt Lehman, Charles Chen, Ronald L. Allen, Anantha R. Sethuraman, Christopher F. Bevis +3 more |
2006-05-30 |
| 7030018 |
Methods and systems for monitoring a parameter of a measurement device during polishing, damage to a specimen during polishing, or a characteristic of a polishing pad or tool |
Kurt Lehman, Charles Chen, Ronald L. Allen, Anantha R. Sethuraman, Christopher F. Bevis +3 more |
2006-04-18 |
| 6935922 |
Methods and systems for generating a two-dimensional map of a characteristic at relative or absolute locations of measurement spots on a specimen during polishing |
Kurt Lehman, Charles Chen, Ronald L. Allen, Anantha R. Sethuraman, Christopher F. Bevis +3 more |
2005-08-30 |
| 6884146 |
Systems and methods for characterizing a polishing process |
Kurt Lehman, Charles Chen, Ronald L. Allen, Anantha R. Sethuraman, Christopher F. Bevis +3 more |
2005-04-26 |
| 6866559 |
Windows configurable to be coupled to a process tool or to be disposed within an opening in a polishing pad |
Kurt Lehman, Charles Chen, Ronald L. Allen, Anantha R. Sethuraman, Christopher F. Bevis +3 more |
2005-03-15 |
| 5500095 |
High efficiency chemical processing |
Susan M. Jordan, Christopher S. Blatt |
1996-03-19 |