Issued Patents All Time
Showing 1–25 of 30 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 9103664 | Automated process control using an adjusted metrology output signal | Shifang Li | 2015-08-11 |
| 8838422 | Process control using ray tracing-based libraries and machine learning systems | Shifang Li | 2014-09-16 |
| 8289527 | Optimization of ray tracing and beam propagation parameters | Shifang Li | 2012-10-16 |
| 8193007 | Etch process control using optical metrology and sensor devices | Xinkang Tian | 2012-06-05 |
| 8173450 | Method of designing an etch stage measurement system | Xinkang Tian | 2012-05-08 |
| 8173451 | Etch stage measurement system | Xinkang Tian | 2012-05-08 |
| 7961306 | Optimizing sensitivity of optical metrology measurements | Shifang Li, Adam E. Norton | 2011-06-14 |
| 7949618 | Training a machine learning system to determine photoresist parameters | Joerg Bischoff, David Hetzer | 2011-05-24 |
| 7761250 | Optical metrology system optimized with design goals | Xinkang Tian, Ching-Ling Meng, Mihail Mihaylov | 2010-07-20 |
| 7761178 | Automated process control using an optical metrology system optimized with design goals | Xinkang Tian, Ching-Ling Meng, Mihail Mihaylov | 2010-07-20 |
| 7742889 | Designing an optical metrology system optimized with signal criteria | Xinkang Tian, Ching-Ling Meng, Mihail Mihalov | 2010-06-22 |
| 7734437 | Apparatus for designing an optical metrology system optimized with signal criteria | Xinkang Tian, Ching-Ling Meng, Mihail Mihalov | 2010-06-08 |
| 7667858 | Automated process control using optical metrology and a correlation between profile models and key profile shape variables | Jeffrey A. Chard, Junwei Bao | 2010-02-23 |
| 7660696 | Apparatus for auto focusing a workpiece using two or more focus parameters | Adam E. Norton, Xinkang Tian | 2010-02-09 |
| 7639351 | Automated process control using optical metrology with a photonic nanojet | Zhigang Chen, Hanyou Chu, Shifang Li | 2009-12-29 |
| 7636649 | Automated process control of a fabrication tool using a dispersion function relating process parameter to dispersion | Shifang Li, Hanyou Chu | 2009-12-22 |
| 7627392 | Automated process control using parameters determined with approximation and fine diffraction models | Wei Liu, Shifang Li, Weidung Yang | 2009-12-01 |
| 7595869 | Optical metrology system optimized with a plurality of design goals | Xinkang Tian, Ching-Ling Meng, Mihail Mihaylov | 2009-09-29 |
| 7589845 | Process control using an optical metrology system optimized with signal criteria | Xinkang Tian, Ching-Ling Meng, Mihail Mihalov | 2009-09-15 |
| 7567352 | Controlling a fabrication tool using support vector machine | Wen Jin, Junwei Bao, Shifang Li | 2009-07-28 |
| 7567353 | Automated process control using optical metrology and photoresist parameters | Joerg Bischoff, David Hetzer | 2009-07-28 |
| 7526354 | Managing and using metrology data for process and equipment control | Junwei Bao, Vi Vuong | 2009-04-28 |
| 7522295 | Consecutive measurement of structures formed on a semiconductor wafer using a polarized reflectometer | Vi Vuong, Junwei Bao | 2009-04-21 |
| 7480062 | Automated process control using parameters determined from a photomask covered by a pellicle | Shifang Li, Sanjay K. Yedur | 2009-01-20 |
| 7444196 | Optimized characterization of wafers structures for optical metrology | Steven Scheer, Alan Nolet | 2008-10-28 |