| 9625937 |
Computation efficiency by diffraction order truncation |
Shifang Li, Weidong Yang, Hanyou Chu |
2017-04-18 |
| 8762100 |
Numerical aperture integration for optical critical dimension (OCD) metrology |
Hanyou Chu, Peilin Jiang |
2014-06-24 |
| 8195435 |
Hybrid diffraction modeling of diffracting structures |
— |
2012-06-05 |
| 7949618 |
Training a machine learning system to determine photoresist parameters |
David Hetzer, Manuel Madriaga |
2011-05-24 |
| 7728976 |
Determining photoresist parameters using optical metrology |
David Hetzer |
2010-06-01 |
| 7639370 |
Apparatus for deriving an iso-dense bias |
Heiko Weichert |
2009-12-29 |
| 7630873 |
Approximating eigensolutions for use in determining the profile of a structure formed on a semiconductor wafer |
Karl Hehl, Xinhui Niu, Wen Jin |
2009-12-08 |
| 7616325 |
Optical metrology optimization for repetitive structures |
Vi Vuong, Junwei Bao |
2009-11-10 |
| 7598099 |
Method of controlling a fabrication process using an iso-dense bias |
Heiko Weichert |
2009-10-06 |
| 7586623 |
Optical metrology of single features |
Xinhui Niu, Junwei Bao |
2009-09-08 |
| 7567353 |
Automated process control using optical metrology and photoresist parameters |
David Hetzer, Manuel Madriaga |
2009-07-28 |
| 7427521 |
Generating simulated diffraction signals for two-dimensional structures |
Xinhui Niu |
2008-09-23 |
| 7414733 |
Azimuthal scanning of a structure formed on a semiconductor wafer |
Shifang Li, Xinhui Niu |
2008-08-19 |
| 7388677 |
Optical metrology optimization for repetitive structures |
Vi Vuong, Junwei Bao |
2008-06-17 |
| 7379192 |
Optical metrology of single features |
Xinhui Niu, Junwei Bao |
2008-05-27 |
| 7274465 |
Optical metrology of a structure formed on a semiconductor wafer using optical pulses |
Junwei Bao |
2007-09-25 |
| 7274472 |
Resolution enhanced optical metrology |
— |
2007-09-25 |
| 7224471 |
Azimuthal scanning of a structure formed on a semiconductor wafer |
Shifang Li, Xinhui Niu |
2007-05-29 |
| 7046375 |
Edge roughness measurement in optical metrology |
Emmanuel Drege, Sanjay K. Yedur |
2006-05-16 |
| 7030999 |
Optical metrology of single features |
Xinhui Niu, Junwei Bao |
2006-04-18 |
| 6947141 |
Overlay measurements using zero-order cross polarization measurements |
Xinhui Niu |
2005-09-20 |
| 6804005 |
Overlay measurements using zero-order cross polarization measurements |
Xinhui Niu |
2004-10-12 |
| 6775015 |
Optical metrology of single features |
Xinhui Niu, Junwei Bao |
2004-08-10 |
| 6772084 |
Overlay measurements using periodic gratings |
Xinhui Niu, Nickhil Jakatdar |
2004-08-03 |