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Joerg Bischoff — 24 Patents

TTTimbre Technologies: 13 patents #5 of 39Top 15%
TLTokyo Electron Limited: 10 patents #748 of 5,567Top 15%
Kla-Tencor: 3 patents #802 of 2,049Top 40%
Ilmenau, DE: #3 of 193 inventorsTop 2%
Overall (All Time): #168,038 of 4,157,543Top 5%
24 Patents All Time
Joerg Bischoff has been granted 24 US patents while listed as an inventor at Timbre Technologies. The first was granted in 2004 and the most recent in April 2017. Joerg Bischoff ranks #168,038 of 4,157,543 US inventors in our database (top 4.0%). Patent records list Joerg Bischoff in Ilmenau, DE.

Patents per Year

Patents granted per year, 2004 to 2017Bar chart with a peak of 6 patents in 2009.peak 62004: 3 patents20042005: 1 patents2006: 2 patents20062007: 3 patents2008: 4 patents20082009: 6 patents2010: 1 patents20102011: 1 patents2012: 1 patents20122014: 1 patents2017: 1 patents2017

Issued Patents All Time

Showing 1–24 of 24 patents

Patent #TitleCo-InventorsDateApprox Value ⓘ
9625937 Computation efficiency by diffraction order truncation Shifang Li, Weidong Yang, Hanyou Chu 2017-04-18
8762100 Numerical aperture integration for optical critical dimension (OCD) metrology Hanyou Chu, Peilin Jiang 2014-06-24 $22,335,000
8195435 Hybrid diffraction modeling of diffracting structures — 2012-06-05 $10,151,000
7949618 Training a machine learning system to determine photoresist parameters David Hetzer, Manuel Madriaga 2011-05-24
7728976 Determining photoresist parameters using optical metrology David Hetzer 2010-06-01
7639370 Apparatus for deriving an iso-dense bias Heiko Weichert 2009-12-29
7630873 Approximating eigensolutions for use in determining the profile of a structure formed on a semiconductor wafer Karl Hehl, Xinhui Niu, Wen Jin 2009-12-08
7616325 Optical metrology optimization for repetitive structures Vi Vuong, Junwei Bao 2009-11-10
7598099 Method of controlling a fabrication process using an iso-dense bias Heiko Weichert 2009-10-06
7586623 Optical metrology of single features Xinhui Niu, Junwei Bao 2009-09-08
7567353 Automated process control using optical metrology and photoresist parameters David Hetzer, Manuel Madriaga 2009-07-28
7427521 Generating simulated diffraction signals for two-dimensional structures Xinhui Niu 2008-09-23
7414733 Azimuthal scanning of a structure formed on a semiconductor wafer Shifang Li, Xinhui Niu 2008-08-19
7388677 Optical metrology optimization for repetitive structures Vi Vuong, Junwei Bao 2008-06-17
7379192 Optical metrology of single features Xinhui Niu, Junwei Bao 2008-05-27
7274465 Optical metrology of a structure formed on a semiconductor wafer using optical pulses Junwei Bao 2007-09-25
7274472 Resolution enhanced optical metrology — 2007-09-25
7224471 Azimuthal scanning of a structure formed on a semiconductor wafer Shifang Li, Xinhui Niu 2007-05-29
7046375 Edge roughness measurement in optical metrology Emmanuel Drege, Sanjay K. Yedur 2006-05-16
7030999 Optical metrology of single features Xinhui Niu, Junwei Bao 2006-04-18
6947141 Overlay measurements using zero-order cross polarization measurements Xinhui Niu 2005-09-20
6804005 Overlay measurements using zero-order cross polarization measurements Xinhui Niu 2004-10-12
6775015 Optical metrology of single features Xinhui Niu, Junwei Bao 2004-08-10
6772084 Overlay measurements using periodic gratings Xinhui Niu, Nickhil Jakatdar 2004-08-03

Frequent Collaborators

Xinhui Niu11 shared
Junwei Bao7 shared
David Hetzer3 shared
Shifang Li3 shared
Hanyou Chu2 shared
Heiko Weichert2 shared

Nearby-Ranked Inventors

Tracy Helen Fung24
Yang Li24
Bo Ching Jiang24
Shoham DEKEL24
David B. Coulter24
Akiko WATANO24
Walter Nistico24
Thomas W. Chalberg, Jr.24
Alan R. Dombrowski24