Issued Patents All Time
Showing 1–24 of 24 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 9625937 | Computation efficiency by diffraction order truncation | Shifang Li, Weidong Yang, Hanyou Chu | 2017-04-18 |
| 8762100 | Numerical aperture integration for optical critical dimension (OCD) metrology | Hanyou Chu, Peilin Jiang | 2014-06-24 |
| 8195435 | Hybrid diffraction modeling of diffracting structures | — | 2012-06-05 |
| 7949618 | Training a machine learning system to determine photoresist parameters | David Hetzer, Manuel Madriaga | 2011-05-24 |
| 7728976 | Determining photoresist parameters using optical metrology | David Hetzer | 2010-06-01 |
| 7639370 | Apparatus for deriving an iso-dense bias | Heiko Weichert | 2009-12-29 |
| 7630873 | Approximating eigensolutions for use in determining the profile of a structure formed on a semiconductor wafer | Karl Hehl, Xinhui Niu, Wen Jin | 2009-12-08 |
| 7616325 | Optical metrology optimization for repetitive structures | Vi Vuong, Junwei Bao | 2009-11-10 |
| 7598099 | Method of controlling a fabrication process using an iso-dense bias | Heiko Weichert | 2009-10-06 |
| 7586623 | Optical metrology of single features | Xinhui Niu, Junwei Bao | 2009-09-08 |
| 7567353 | Automated process control using optical metrology and photoresist parameters | David Hetzer, Manuel Madriaga | 2009-07-28 |
| 7427521 | Generating simulated diffraction signals for two-dimensional structures | Xinhui Niu | 2008-09-23 |
| 7414733 | Azimuthal scanning of a structure formed on a semiconductor wafer | Shifang Li, Xinhui Niu | 2008-08-19 |
| 7388677 | Optical metrology optimization for repetitive structures | Vi Vuong, Junwei Bao | 2008-06-17 |
| 7379192 | Optical metrology of single features | Xinhui Niu, Junwei Bao | 2008-05-27 |
| 7274465 | Optical metrology of a structure formed on a semiconductor wafer using optical pulses | Junwei Bao | 2007-09-25 |
| 7274472 | Resolution enhanced optical metrology | — | 2007-09-25 |
| 7224471 | Azimuthal scanning of a structure formed on a semiconductor wafer | Shifang Li, Xinhui Niu | 2007-05-29 |
| 7046375 | Edge roughness measurement in optical metrology | Emmanuel Drege, Sanjay K. Yedur | 2006-05-16 |
| 7030999 | Optical metrology of single features | Xinhui Niu, Junwei Bao | 2006-04-18 |
| 6947141 | Overlay measurements using zero-order cross polarization measurements | Xinhui Niu | 2005-09-20 |
| 6804005 | Overlay measurements using zero-order cross polarization measurements | Xinhui Niu | 2004-10-12 |
| 6775015 | Optical metrology of single features | Xinhui Niu, Junwei Bao | 2004-08-10 |
| 6772084 | Overlay measurements using periodic gratings | Xinhui Niu, Nickhil Jakatdar | 2004-08-03 |