Issued Patents All Time
Showing 1–25 of 40 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 10910201 | Synthetic wavelengths for endpoint detection in plasma etching | Yan Chen, Xinkang Tian | 2021-02-02 |
| 10692705 | Advanced optical sensor and method for detecting an optical event in a light emission signal in a plasma chamber | Mihail Mihaylov, Xinkang Tian, Ching-Ling Meng, Jason Ferns, Joel Ng +2 more | 2020-06-23 |
| 10002804 | Method of endpoint detection of plasma etching process using multivariate analysis | Yan Chen, Serguei Komarov | 2018-06-19 |
| 9607265 | Accurate and fast neural network training for library-based critical dimension (CD) metrology | Wen Jin, Junwei Bao, Lie-Quan Lee, Leonid Poslavsky | 2017-03-28 |
| 9330990 | Method of endpoint detection of plasma etching process using multivariate analysis | Yan Chen, Serguei Komarov | 2016-05-03 |
| 8577820 | Accurate and fast neural network training for library-based critical dimension (CD) metrology | Wen Jin, Junwei Bao, Lie-Quan Lee, Leonid Poslavsky | 2013-11-05 |
| 8452718 | Determination of training set size for a machine learning system | Wen Jin, Walter D. Mieher | 2013-05-28 |
| 8346506 | Transforming metrology data from a semiconductor treatment system using multivariate analysis | Junwei Bao, Yan Chen, Heiko Weichert, Sebastien Egret | 2013-01-01 |
| 8170833 | Transforming metrology data from a semiconductor treatment system using multivariate analysis | Junwei Bao, Yan Chen, Weichert Heiko, Sebastien Egret | 2012-05-01 |
| 7783669 | Data flow management in generating profile models used in optical metrology | Hong Qiu, Junwei Bao, Wei Liu, Jeffrey A. Chard, Miao Liu +2 more | 2010-08-24 |
| 7765076 | Allocating processing units to processing clusters to generate simulated diffraction signals | Hemalatha Erva, Hong Qiu, Junwei Bao | 2010-07-27 |
| 7765234 | Data flow management in generating different signal formats used in optical metrology | Hong Qiu, Junwei Bao, Wei Liu, Jeffrey A. Chard, Miao Liu +2 more | 2010-07-27 |
| 7742888 | Allocating processing units to generate simulated diffraction signals used in optical metrology | Hemalatha Erva, Hong Qiu, Junwei Bao | 2010-06-22 |
| 7616325 | Optical metrology optimization for repetitive structures | Junwei Bao, Joerg Bischoff | 2009-11-10 |
| 7588949 | Optical metrology model optimization based on goals | Emmanuel Drege, Shifang Li, Junwei Bao | 2009-09-15 |
| 7526354 | Managing and using metrology data for process and equipment control | Manuel Madriaga, Junwei Bao | 2009-04-28 |
| 7525673 | Optimizing selected variables of an optical metrology system | Junwei Bao | 2009-04-28 |
| 7522295 | Consecutive measurement of structures formed on a semiconductor wafer using a polarized reflectometer | Junwei Bao, Manuel Madriaga | 2009-04-21 |
| 7522294 | Measuring a process parameter of a semiconductor fabrication process using optical metrology | Hanyou Chu, Yan Chen | 2009-04-21 |
| 7523021 | Weighting function to enhance measured diffraction signals in optical metrology | Junwei Bao, Shifang Li, Yan Chen | 2009-04-21 |
| 7515282 | Modeling and measuring structures with spatially varying properties in optical metrology | Shifang Li, Alan Nolet, Junwei Bao | 2009-04-07 |
| 7505153 | Model and parameter selection for optical metrology | Emmanuel Drege, Junwei Bao, Srinivas Doddi, Xinhui Niu, Nickhil Jakatdar | 2009-03-17 |
| 7505148 | Matching optical metrology tools using spectra enhancement | Yan Chen, Holger Tuitje | 2009-03-17 |
| 7495781 | Optimizing selected variables of an optical metrology model | Junwei Bao | 2009-02-24 |
| 7474993 | Selection of wavelengths for integrated circuit optical metrology | Srinivas Doddi, Lawrence Lane, Michael Laughery, Junwei Bao, Kelly Barry +2 more | 2009-01-06 |