Issued Patents All Time
Showing 25 most recent of 43 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 10451412 | Apparatus and methods for detecting overlay errors using scatterometry | Michael Adel, Ibrahim Abdulhalim, Ady Levy, Michael Friedmann | 2019-10-22 |
| 10401740 | System and method for focus determination using focus-sensitive overlay targets | — | 2019-09-03 |
| 10352876 | Signal response metrology for scatterometry based overlay measurements | Andrei V. Shchegrov, Stilian Ivanov Pandev, Jonathan M. Madsen, Alexander Kuznetsov | 2019-07-16 |
| 10024654 | Method and system for determining in-plane distortions in a substrate | Mark D. Smith, Jose Solomon, Stuart Sherwin, Ady Levy | 2018-07-17 |
| 9885962 | Methods and apparatus for measuring semiconductor device overlay using X-ray metrology | Andrei Veldman, Michael S. Bakeman, Andrei V. Shchegrov | 2018-02-06 |
| 9702693 | Apparatus for measuring overlay errors | Mark Ghinovker, Michael Adel, Ady Levy, Dan Wack | 2017-07-11 |
| 9470639 | Optical metrology with reduced sensitivity to grating anomalies | Guorong V. Zhuang, Shankar Krishnan, Lanhua Wei, Paul Aoyagi | 2016-10-18 |
| 9347879 | Apparatus and methods for detecting overlay errors using scatterometry | Michael Adel, Mark Ghinovker | 2016-05-24 |
| 9081287 | Methods of measuring overlay errors in area-imaging e-beam lithography | Allen M. Carroll | 2015-07-14 |
| 9030661 | Alignment measurement system | Michael Robert Gluszczak, Joseph A. DiRegolo | 2015-05-12 |
| 8452718 | Determination of training set size for a machine learning system | Wen Jin, Vi Vuong | 2013-05-28 |
| 8330281 | Overlay marks, methods of overlay mark design and methods of overlay measurements | Mark Ghinovker, Michael Adel, Ady Levy, Dan Wack | 2012-12-11 |
| 8040511 | Azimuth angle measurement | Shankar Krishnan, Haixing Zhou, Haiming Wang, David Lidsky | 2011-10-18 |
| 7933016 | Apparatus and methods for detecting overlay errors using scatterometry | Ady Levy, Boris Golovanevsky, Michael Friedmann, Ian Smith, Michael Adel +10 more | 2011-04-26 |
| 7879627 | Overlay marks and methods of manufacturing such marks | Mark Ghinovker, Michael Adel, Ady Levy, Dan Wack | 2011-02-01 |
| 7876440 | Apparatus and methods for detecting overlay errors using scatterometry | Ady Levy, Boris Golovanesky, Michael Friedmann, Ian Smith, Michael Adel +1 more | 2011-01-25 |
| 7867693 | Methods for forming device structures on a wafer | — | 2011-01-11 |
| 7826071 | Parametric profiling using optical spectroscopic systems | Andrei V. Shchegrov, Anatoly Fabrikant, Mehrdad Nikoonahad, Ady Levy, Daniel Wack +2 more | 2010-11-02 |
| 7663753 | Apparatus and methods for detecting overlay errors using scatterometry | Ady Levy, Boris Golovanevsky, Michael Friedmann, Ian Smith, Michael Adel +10 more | 2010-02-16 |
| 7656512 | Method for determining lithographic focus and exposure | Thaddeus Gerard Dziura, Ady Levy, Chris Mack | 2010-02-02 |
| 7616313 | Apparatus and methods for detecting overlay errors using scatterometry | Daniel Kandel, Boris Golovanevsky | 2009-11-10 |
| 7564557 | Apparatus and methods for detecting overlay errors using scatterometry | Ady Levy, Boris Golovanesky, Michael Friedmann, Ian Smith, Michael Adel +1 more | 2009-07-21 |
| 7433040 | Apparatus and methods for detecting overlay errors using scatterometry | Ady Levy, Boris Golovanesky, Michael Friedmann, Ian Smith, Michael Adel +3 more | 2008-10-07 |
| 7385699 | Apparatus and methods for detecting overlay errors using scatterometry | Ady Levy, Boris Golovanesky, Michael Friedmann, Ian Smith, Michael Adel +3 more | 2008-06-10 |
| 7382447 | Method for determining lithographic focus and exposure | Thaddeus Gerard Dziura, Ady Levy, Chris Mack | 2008-06-03 |