Issued Patents All Time
Showing 1–19 of 19 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 11231362 | Multi-environment polarized infrared reflectometer for semiconductor metrology | Shankar Krishnan, David Y. Wang, Xuefeng Liu, Mengmeng Ye, Dawei Hu | 2022-01-25 |
| 11137350 | Mid-infrared spectroscopy for measurement of high aspect ratio structures | David Y. Wang, Shankar Krishnan | 2021-10-05 |
| 10006865 | Confined illumination for small spot size metrology | Derrick Shaughnessy, Michael S. Bakeman, Andrei V. Shchegrov, Leonid Poslavsky | 2018-06-26 |
| 9970863 | Optical metrology with reduced focus error sensitivity | Shankar Krishnan, David Y. Wang, Xuefeng Liu | 2018-05-15 |
| 9846132 | Small-angle scattering X-ray metrology systems and methods | Michael S. Bakeman, Andrei V. Shchegrov, Ady Levy, John J. Hench | 2017-12-19 |
| 9719932 | Confined illumination for small spot size metrology | Derrick Shaughnessy, Michael S. Bakeman, Andrei V. Shchegrov, Leonid Poslavsky | 2017-08-01 |
| 9693439 | High brightness liquid droplet X-ray source for semiconductor metrology | Michael S. Bakeman, Andrei V. Shchegrov, Jonathan M. Madsen | 2017-06-27 |
| 9470639 | Optical metrology with reduced sensitivity to grating anomalies | Shankar Krishnan, Lanhua Wei, Walter D. Mieher, Paul Aoyagi | 2016-10-18 |
| 9404872 | Selectably configurable multiple mode spectroscopic ellipsometry | Haiming Wang, Shankar Krishnan, Klaus Flock, Johannes D. de Veer | 2016-08-02 |
| 9228943 | Dynamically adjustable semiconductor metrology system | David Y. Wang, Johannes D. de Veer, Kevin Peterlinz, Shankar Krishnan | 2016-01-05 |
| 9156068 | Methods and apparatus for cleaning objects in a chamber of an optical instrument by generating reactive ions using photon radiation | Leonard E. Klebanoff, Gildardo Delgado, Jeromy T. Hollenshead, Karl R. Umstadter, Elena Starodub | 2015-10-13 |
| 9146156 | Light source tracking in optical metrology system | Shankar Krishnan, Johannes D. de Veer, Klaus Flock, David Y. Wang, Lawrence D. Rotter | 2015-09-29 |
| 8790603 | Apparatus for purifying a controlled-pressure environment | Gildardo Delgado | 2014-07-29 |
| 8570514 | Optical system polarizer calibration | Johannes D. de Veer, Leonid Poslavsky, Shankar Krishnan | 2013-10-29 |
| 8045179 | Bright and dark field scatterometry systems for line roughness metrology | Steven Russel Spielman, Leonid Poslavsky, Daniel Wack, John Fielden | 2011-10-25 |
| 7928390 | Infrared metrology | John Fielden | 2011-04-19 |
| 7929667 | High brightness X-ray metrology | John Fielden | 2011-04-19 |
| 7760364 | Systems and methods for near-field heterodyne spectroscopy | John Fielden, Christopher F. Bevis | 2010-07-20 |
| 6713753 | Combination of normal and oblique incidence polarimetry for the characterization of gratings | Pablo I. Rovira, John D. Heaton | 2004-03-30 |