PR

Pablo I. Rovira

NI Nanometrics Incorporated: 11 patents #3 of 127Top 3%
KL Kla: 3 patents #125 of 758Top 20%
KL Kla-Tenor: 1 patents #2 of 33Top 7%
🗺 California: #40,325 of 386,348 inventorsTop 15%
Overall (All Time): #314,234 of 4,157,543Top 8%
15
Patents All Time

Issued Patents All Time

Showing 1–15 of 15 patents

Patent #TitleCo-InventorsDate
11562289 Loosely-coupled inspection and metrology system for high-volume production process monitoring Song Wu, Yin Xu, Andrei V. Shchegrov, Lie-Quan Lee, Jonathan M. Madsen 2023-01-24
11268901 Variable aperture mask Barry Blasenheim, Noam Sapiens, Michael Friedmann 2022-03-08
10663392 Variable aperture mask Barry Blasenheim, Noam Sapiens, Michael Friedmann 2020-05-26
10139352 Measurement of small box size targets Stilian Ivanov Pandev, Wei Lu, Andrei V. Shchegrov, Jonathan M. Madsen 2018-11-27
8825444 Automated system check for metrology unit Jaime Poris, Jonathan M. Madsen, Scott Penner 2014-09-02
8427645 Mueller matrix spectroscopy using chiroptic Pedro Vagos 2013-04-23
7372565 Spectrometer measurement of diffracting structures James M. Holden, William A. McGahan, Richard A. Yarussi, Roger R. Lowe-Webb 2008-05-13
7173417 Eddy current sensor with concentric confocal distance sensor Jaime Poris, Claudio L. Rampoldi, Christopher W. Blaufus 2007-02-06
7115858 Apparatus and method for the measurement of diffracting structures James M. Holden, William A. McGahan, Richard A. Yarussi, Roger R. Lowe-Webb 2006-10-03
7064828 Pulsed spectroscopy with spatially variable polarization modulation element Lars Markwort 2006-06-20
7061613 Polarizing beam splitter and dual detector calibration of metrology device having a spatial phase modulation Chunsheng Huang, Jaime Poris 2006-06-13
6856384 Optical metrology system with combined interferometer and ellipsometer 2005-02-15
6713753 Combination of normal and oblique incidence polarimetry for the characterization of gratings Guorong V. Zhuang, John D. Heaton 2004-03-30
6665070 Alignment of a rotatable polarizer with a sample Richard A. Yarussi 2003-12-16
6522406 Correcting the system polarization sensitivity of a metrology tool having a rotatable polarizer Richard A. Yarussi, James M. Holden, Roger R. Lowe-Webb 2003-02-18