Issued Patents All Time
Showing 1–13 of 13 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 7508976 | Local process variation correction for overlay measurement | Weidong Yang, Silvio J. Rabello | 2009-03-24 |
| 7372565 | Spectrometer measurement of diffracting structures | James M. Holden, William A. McGahan, Richard A. Yarussi, Pablo I. Rovira | 2008-05-13 |
| 7236244 | Alignment target to be measured with multiple polarization states | Weidong Yang | 2007-06-26 |
| 7230705 | Alignment target with designed in offset | Weidong Yang, John D. Heaton, Guonguang Li | 2007-06-12 |
| 7115858 | Apparatus and method for the measurement of diffracting structures | James M. Holden, William A. McGahan, Richard A. Yarussi, Pablo I. Rovira | 2006-10-03 |
| 7061615 | Spectroscopically measured overlay target | — | 2006-06-13 |
| 7046361 | Positioning two elements using an alignment target with a designed offset | Weidong Yang, John D. Heaton | 2006-05-16 |
| 6992764 | Measuring an alignment target with a single polarization state | Weidong Yang, Silvio J. Rabello, John D. Heaton | 2006-01-31 |
| 6982793 | Method and apparatus for using an alignment target with designed in offset | Weidong Yang, John D. Heaton, Guoguang Li | 2006-01-03 |
| 6970255 | Encoder measurement based on layer thickness | Blaine R. Spady, John D. Heaton, Weidong Yang | 2005-11-29 |
| 6958819 | Encoder with an alignment target | John D. Heaton, Weidong Yang | 2005-10-25 |
| 6949462 | Measuring an alignment target with multiple polarization states | Weidong Yang | 2005-09-27 |
| 6522406 | Correcting the system polarization sensitivity of a metrology tool having a rotatable polarizer | Pablo I. Rovira, Richard A. Yarussi, James M. Holden | 2003-02-18 |