Issued Patents All Time
Showing 1–25 of 97 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 12379669 | Massive overlay metrology sampling with multiple measurement columns | Jonathan M. Madsen, Amnon Manassen, Andrew V. Hill, Yossi Simon, Gilad Laredo +1 more | 2025-08-05 |
| 12092966 | Device feature specific edge placement error (EPE) | Amnon Manassen, Nadav Gutman, Frank Laske | 2024-09-17 |
| 12019030 | Methods and systems for targeted monitoring of semiconductor measurement quality | Antonio Arion Gellineau, Hyowon Park, Pavan Gurudath, Christopher Liman, Jung Heon Song | 2024-06-25 |
| 11990380 | Methods and systems for combining x-ray metrology data sets to improve parameter estimation | Christopher Liman, Antonio Arion Gellineau, Sungchul Yoo | 2024-05-21 |
| 11913874 | Optical metrology tool equipped with modulated illumination sources | Lawrence D. Rotter, David Y. Wang, Andrei Veldman, Kevin Peterlinz, Gregory Brady +1 more | 2024-02-27 |
| 11899375 | Massive overlay metrology sampling with multiple measurement columns | Jonathan M. Madsen, Amnon Manassen, Andrew V. Hill, Yossi Simon, Gilad Laredo +1 more | 2024-02-13 |
| 11880142 | Self-calibrating overlay metrology | Stilian Ivanov Pandev, Min-Yeong Moon, Jonathan M. Madsen, Dimitry Sanko, Liran Yerushalmi +2 more | 2024-01-23 |
| 11796390 | Bandgap measurements of patterned film stacks using spectroscopic metrology | Tianhan Wang, Aaron Rosenberg, Dawei Hu, Alexander Kuznetsov, Manh Dang Nguyen +8 more | 2023-10-24 |
| 11784097 | Measurement of overlay error using device inspection system | Choon Hoong Hoo, Fangren Ji, Amnon Manassen, Liran Yerushalmi, Antonio Mani +3 more | 2023-10-10 |
| 11713959 | Overlay metrology using spectroscopic phase | Ido Dolev, Yoram Uziel, Amnon Manassen | 2023-08-01 |
| 11698251 | Methods and systems for overlay measurement based on soft X-ray Scatterometry | Nadav Gutman, Alexander Kuznetsov, Antonio Arion Gellineau | 2023-07-11 |
| 11604420 | Self-calibrating overlay metrology | Stilian Ivanov Pandev, Min-Yeong Moon, Jonathan M. Madsen, Dimitry Sanko, Liran Yerushalmi +2 more | 2023-03-14 |
| 11604063 | Self-calibrated overlay metrology using a skew training sample | Stilian Ivanov Pandev, Min-Yeong Moon, Jonathan M. Madsen, Dimitry Sanko, Liran Yerushalmi +2 more | 2023-03-14 |
| 11562289 | Loosely-coupled inspection and metrology system for high-volume production process monitoring | Song Wu, Yin Xu, Lie-Quan Lee, Pablo I. Rovira, Jonathan M. Madsen | 2023-01-24 |
| 11536674 | Systems and methods for combined reflectometry and photoelectron spectroscopy | Alexander Kuznetsov, Oleg Khodykin | 2022-12-27 |
| 11519719 | Transmission small-angle X-ray scattering metrology system | Antonio Arion Gellineau, Sergey Zalubovsky | 2022-12-06 |
| 11428650 | Computationally efficient x-ray based overlay measurement | John J. Hench, Michael S. Bakeman | 2022-08-30 |
| 11378451 | Bandgap measurements of patterned film stacks using spectroscopic metrology | Tianhan Wang, Aaron Rosenberg, Dawei Hu, Alexander Kuznetsov, Manh Dang Nguyen +8 more | 2022-07-05 |
| 11333621 | Methods and systems for semiconductor metrology based on polychromatic soft X-Ray diffraction | Daniel Wack, Oleg Khodykin, Alexander Kuznetsov, Nikolay Artemiev, Michael Friedmann | 2022-05-17 |
| 11300524 | Pupil-plane beam scanning for metrology | Andrew V. Hill, Amnon Manassen, Avi Abramov, Asaf Granot | 2022-04-12 |
| 10969328 | Optical metrology tool equipped with modulated illumination sources | Lawrence D. Rotter, David Y. Wang, Andrei Veldman, Kevin Peterlinz, Gregory Brady +1 more | 2021-04-06 |
| 10943838 | Measurement of overlay error using device inspection system | Choon Hoong Hoo, Fangren Ji, Amnon Manassen, Liran Yerushalmi, Antonio Mani +3 more | 2021-03-09 |
| 10935893 | Differential methods and apparatus for metrology of semiconductor targets | Stilian Ivanov Pandev | 2021-03-02 |
| 10895541 | Systems and methods for combined x-ray reflectometry and photoelectron spectroscopy | Alexander Kuznetsov, Oleg Khodykin | 2021-01-19 |
| 10801953 | Semiconductor metrology based on hyperspectral imaging | David Y. Wang, Alexander Buettner, Stilian Ivanov Pandev, Emanuel Saerchen, Barry Blasenheim | 2020-10-13 |