Issued Patents All Time
Showing 51–75 of 97 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 10107765 | Apparatus, techniques, and target designs for measuring semiconductor parameters | Noam Sapiens, Stilian Ivanov Pandev | 2018-10-23 |
| 10062157 | Compressive sensing for metrology | Stilian Ivanov Pandev, Alexander Kuznetsov, Gregory Brady, Noam Sapiens, John J. Hench | 2018-08-28 |
| 10013518 | Model building and analysis engine for combined X-ray and optical metrology | Michael S. Bakeman, Qiang Zhao, Zhengquan Tan | 2018-07-03 |
| 10006865 | Confined illumination for small spot size metrology | Derrick Shaughnessy, Michael S. Bakeman, Guorong V. Zhuang, Leonid Poslavsky | 2018-06-26 |
| 9915524 | Optical metrology with small illumination spot size | Noam Sapiens, Kevin Peterlinz, Alexander Buettner, Kerstin Purrucker | 2018-03-13 |
| 9885962 | Methods and apparatus for measuring semiconductor device overlay using X-ray metrology | Andrei Veldman, Michael S. Bakeman, Walter D. Mieher | 2018-02-06 |
| 9879977 | Apparatus and method for optical metrology with optimized system parameters | — | 2018-01-30 |
| 9875946 | On-device metrology | Jonathan M. Madsen, Stilian Ivanov Pandev, Ady Levy, Daniel Kandel, Michael Adel +1 more | 2018-01-23 |
| 9846132 | Small-angle scattering X-ray metrology systems and methods | Michael S. Bakeman, Ady Levy, Guorong V. Zhuang, John J. Hench | 2017-12-19 |
| 9826614 | Compac X-ray source for semiconductor metrology | Michael S. Bakeman | 2017-11-21 |
| 9816810 | Measurement of multiple patterning parameters | Shankar Krishnan, Kevin Peterlinz, Thaddeus Gerard Dziura, Noam Sapiens, Stilian Ivanov Pandev | 2017-11-14 |
| 9784690 | Apparatus, techniques, and target designs for measuring semiconductor parameters | Noam Sapiens, Stilian Ivanov Pandev | 2017-10-10 |
| 9778213 | Metrology tool with combined XRF and SAXS capabilities | Michael S. Bakeman, Kevin Peterlinz, Thaddeus Gerard Dziura | 2017-10-03 |
| 9719932 | Confined illumination for small spot size metrology | Derrick Shaughnessy, Michael S. Bakeman, Guorong V. Zhuang, Leonid Poslavsky | 2017-08-01 |
| 9693439 | High brightness liquid droplet X-ray source for semiconductor metrology | Guorong V. Zhuang, Michael S. Bakeman, Jonathan M. Madsen | 2017-06-27 |
| 9535018 | Combined x-ray and optical metrology | Kevin Peterlinz, Michael S. Bakeman, Thaddeus Gerard Dziura | 2017-01-03 |
| 9518916 | Compressive sensing for metrology | Stilian Ivanov Pandev, Alexander Kuznetsov, Gregory Brady, Noam Sapiens, John J. Hench | 2016-12-13 |
| 9512985 | Systems for providing illumination in optical metrology | Gregory Brady, Lawrence D. Rotter, Derrick Shaughnessy, Anatoly Shchemelinin, Ilya Bezel +16 more | 2016-12-06 |
| 9490182 | Measurement of multiple patterning parameters | Shankar Krishnan, Kevin Peterlinz, Thaddeus Gerard Dziura, Noam Sapiens, Stilian Ivanov Pandev | 2016-11-08 |
| 9412673 | Multi-model metrology | In-Kyo Kim, Xin Li, Leonid Poslavsky, Liequan Lee, Meng Cao +2 more | 2016-08-09 |
| 9400246 | Optical metrology tool equipped with modulated illumination sources | Lawrence D. Rotter, David Y. Wang, Andrei Veldman, Kevin Peterlinz, Gregory Brady +1 more | 2016-07-26 |
| 9310290 | Multiple angles of incidence semiconductor metrology systems and methods | David Y. Wang, Klaus Flock, Lawrence D. Rotter, Shankar Krishnan, Johannes D. de Veer +3 more | 2016-04-12 |
| 9311431 | Secondary target design for optical measurements | Sungchul Yoo, Thaddeus Gerard Dziura, Inkyo Kim, Seunghwan Lee, ByeoungSu Hwang +1 more | 2016-04-12 |
| 9291554 | Method of electromagnetic modeling of finite structures and finite illumination for metrology and inspection | Alexander Kuznetsov, Kevin Peterlinz, Leonid Poslavsky, Xuefeng Liu | 2016-03-22 |
| 9255877 | Metrology system optimization for parameter tracking | Andrei Veldman, Gregory Brady, Thaddeus Gerard Dziura, Stilian Ivanov Pandev, Alexander Kuznetsov | 2016-02-09 |