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Full beam metrology for x-ray scatterometry systems |
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Optimizing computational efficiency by multiple truncation of spatial harmonics |
— |
2021-08-10 |
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Methods and systems for characterization of an x-ray beam with high spatial resolution |
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Optical metrology tool equipped with modulated illumination sources |
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Full beam metrology for X-ray scatterometry systems |
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Hybrid metrology for patterned wafer characterization |
Boxue Chen, Alexander Kuznetsov, Andrei V. Shchegrov |
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Phase revealing optical and X-ray semiconductor metrology |
John J. Hench |
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2019-01-22 |
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Methods and apparatus for measuring semiconductor device overlay using X-ray metrology |
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Computation efficiency by iterative spatial harmonics order truncation |
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Optical metrology tool equipped with modulated illumination sources |
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Model-based metrology using tesselation-based discretization |
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2010-11-02 |
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Model-based measurement of semiconductor device features with feed forward use of data for dimensionality reduction |
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Time-domain computation of scattering spectra for use in spectroscopic metrology |
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