| 11968772 |
Optical etendue matching methods for extreme ultraviolet metrology |
Zefram Marks, Larissa Juschkin |
2024-04-23 |
$90,253,000 |
| 11469571 |
Fast phase-shift interferometry by laser frequency shift |
Haifeng Huang, Rui-fang Shi |
2022-10-11 |
$94,011,000 |
| 11333621 |
Methods and systems for semiconductor metrology based on polychromatic soft X-Ray diffraction |
Oleg Khodykin, Andrei V. Shchegrov, Alexander Kuznetsov, Nikolay Artemiev, Michael Friedmann |
2022-05-17 |
|
| 11112691 |
Inspection system with non-circular pupil |
Damon F. Kvamme, Rui-fang Shi, Sseunhyeun Jo, Xin Ye |
2021-09-07 |
$109,732,000 |
| 10438825 |
Spectral reflectometry for in-situ process monitoring and control |
Prateek Jain, Kevin Peterlinz, Andrei V. Shchegrov, Shankar Krishnan |
2019-10-08 |
|
| 9759912 |
Particle and chemical control using tunnel flow |
Frank Chilese, Gildardo Delgado, John R. Torczynski, Leonard E. Klebanoff |
2017-09-12 |
|
| 9625810 |
Source multiplexing illumination for mask inspection |
Daimian Wang, Damon F. Kvamme, Tao-Yi Fu |
2017-04-18 |
|
| 9544984 |
System and method for generation of extreme ultraviolet light |
Alexander N. Bykanov, Oleg Khodykin, Konstantin Tsigutkin, Layton Hale, Joseph F. Walsh +3 more |
2017-01-10 |
|
| 9335637 |
Laser-produced plasma EUV source with reduced debris generation utilizing predetermined non-thermal laser ablation |
Gildardo Delgado |
2016-05-10 |
|
| 9295147 |
EUV light source using cryogenic droplet targets in mask inspection |
Alexander N. Bykanov, Oleg Khodykin |
2016-03-22 |
|
| 9164388 |
Temperature control in EUV reticle inspection tool |
Frank Chilese, Douglas Fowler |
2015-10-20 |
|
| 9151881 |
Phase grating for mask inspection system |
Daimian Wang, Oleg Khodykin, Li-Ping Wang, Yanwei Liu |
2015-10-06 |
|
| 8941336 |
Optical characterization systems employing compact synchrotron radiation sources |
Yanwei Liu |
2015-01-27 |
$15,704,000 |
| 8917432 |
Multiplexing EUV sources in reticle inspection |
Daimian Wang, Karl R. Umstadter, Ed Ma, Frank Chilese |
2014-12-23 |
$24,315,000 |
| 8842272 |
Apparatus for EUV imaging and methods of using same |
Damon F. Kvamme, John Rogers, James P. McGuire, John M. Rodgers |
2014-09-23 |
$22,964,000 |
| 8798966 |
Measuring critical dimensions of a semiconductor structure |
John J. Hench, Edward Ratner, Yaoming SHI, Andrei Veldman |
2014-08-05 |
$10,997,000 |
| 8772731 |
Apparatus and method for synchronizing sample stage motion with a time delay integration charge-couple device in a semiconductor inspection tool |
Pradeep Subrahmanyan, Michael J. Wright, David Alles |
2014-07-08 |
$16,579,000 |
| 8749179 |
Optical characterization systems employing compact synchrotron radiation sources |
Yanwei Liu |
2014-06-10 |
$22,388,000 |
| 8045179 |
Bright and dark field scatterometry systems for line roughness metrology |
Guorong V. Zhuang, Steven Russel Spielman, Leonid Poslavsky, John Fielden |
2011-10-25 |
$7,626,000 |
| 7951672 |
Measurement and control of strained devices |
Ady Levy, John Fielden |
2011-05-31 |
$20,554,000 |
| 7838309 |
Measurement and control of strained devices |
Ady Levy, John Fielden |
2010-11-23 |
$9,223,000 |
| 7826071 |
Parametric profiling using optical spectroscopic systems |
Andrei V. Shchegrov, Anatoly Fabrikant, Mehrdad Nikoonahad, Ady Levy, Noah Bareket +2 more |
2010-11-02 |
$18,721,000 |
| 7826072 |
Method for optimizing the configuration of a scatterometry measurement system |
Andrei Veldman, Edward Ratner, John J. Hench, Noah Bareket |
2010-11-02 |
$18,721,000 |
| 7821654 |
System for scatterometric measurements and applications |
Anatoly Fabrikant, Guoheng Zhao, Mehrdad Nikoonahad |
2010-10-26 |
$16,789,000 |
| 7716003 |
Model-based measurement of semiconductor device features with feed forward use of data for dimensionality reduction |
Andrei Veldman, Edward Ratner, John J. Hench, Noah Bareket |
2010-05-11 |
$6,521,000 |
