Patent Leaderboard
USPTO Patent Rankings Data through Dec 31, 2025
Home › Method for optimizing the configuration of a scatterometry measurement system

Method for optimizing the configuration of a scatterometry measurement system

US Patent 7826072 · Granted Nov 2, 2010

Estimated economic value: $18,721,000 ⓘ

Assignee

Inventors

View full patent text on Google Patents →

More Patents by These Inventors

Corneal topography measurement and alignment of corneal surgical procedures2025
Forward library based seeding for efficient X-ray scatterometry measurements2025
Methods and systems for measurement of semiconductor structures with multi-pass 2025
Full beam metrology for x-ray scatterometry systems2025
Full beam metrology for x-ray scatterometry systems2025
Confocal laser eye surgery system2024
Continuous disinfection of human occupied space2024
Registration of LOI fiducials with camera2024
Optical etendue matching methods for extreme ultraviolet metrology2024
Optical metrology tool equipped with modulated illumination sources2024
Laser beam calibration and beam quality measurement in laser surgery systems2024
Corneal topography measurement and alignment of corneal surgical procedures2024