Patent Leaderboard
USPTO Patent Rankings Data through Dec 31, 2025
Home › Full beam metrology for x-ray scatterometry systems

Full beam metrology for x-ray scatterometry systems

US Patent 12320763 · Granted Jun 3, 2025

Assignee

Inventors

View full patent text on Google Patents →

More Patents by These Inventors

Optical and X-ray metrology methods for patterned semiconductor structures with 2025
Forward library based seeding for efficient X-ray scatterometry measurements2025
Methods and systems for measurement of semiconductor structures with multi-pass 2025
Methods and systems for regularizing the optimization of application specific se2025
Methods and systems for targeted monitoring of semiconductor measurement quality2024
Methods and systems for combining x-ray metrology data sets to improve parameter2024
Process monitoring of deep structures with X-ray scatterometry2024
Process monitoring of deep structures with X-ray scatterometry2024
Optical metrology tool equipped with modulated illumination sources2024
Methods and systems for overlay measurement based on soft X-ray Scatterometry2023
Transmission small-angle X-ray scattering metrology system2022
Transmission small-angle X-ray scattering metrology system2022