Issued Patents All Time
Showing 1–13 of 13 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 11796390 | Bandgap measurements of patterned film stacks using spectroscopic metrology | Tianhan Wang, Aaron Rosenberg, Dawei Hu, Alexander Kuznetsov, Manh Dang Nguyen +8 more | 2023-10-24 |
| 11422095 | Scatterometry modeling in the presence of undesired diffraction orders | Phillip Atkins, Shankar Krishnan, David C. S. Wu, Emily Chiu | 2022-08-23 |
| 11378451 | Bandgap measurements of patterned film stacks using spectroscopic metrology | Tianhan Wang, Aaron Rosenberg, Dawei Hu, Alexander Kuznetsov, Manh Dang Nguyen +8 more | 2022-07-05 |
| 11380594 | Automatic optimization of measurement accuracy through advanced machine learning techniques | Tianrong Zhan, Yin Xu | 2022-07-05 |
| 11156548 | Measurement methodology of advanced nanostructures | Manh Dang Nguyen, Phillip Atkins, Alexander Kuznetsov, Natalia Malkova, Paul Aoyagi +3 more | 2021-10-26 |
| 11099137 | Visualization of three-dimensional semiconductor structures | Aaron Rosenberg, Jonathan Iloreta, Thaddeus Gerard Dziura, Antonio Arion Gellineau, Yin Xu +5 more | 2021-08-24 |
| 10794839 | Visualization of three-dimensional semiconductor structures | Aaron Rosenberg, Jonathan Iloreta, Thaddeus Gerard Dziura, Antonio Arion Gellineau, Yin Xu +5 more | 2020-10-06 |
| 10732515 | Detection and measurement of dimensions of asymmetric structures | Phillip Atkins, Qi Dai | 2020-08-04 |
| 10678226 | Adaptive numerical aperture control method and system | Qiang Wang, Xin Li, Qiang Zhao | 2020-06-09 |
| 10648793 | Library expansion system, method, and computer program product for metrology | Leonid Poslavsky | 2020-05-12 |
| 10393647 | System, method, and computer program product for automatically determining a parameter causing an abnormal semiconductor metrology measurement | Qiang Zhao, Jonathan Iloreta, Hong Qiu, Leonid Poslavsky | 2019-08-27 |
| 10190868 | Metrology system, method, and computer program product employing automatic transitioning between utilizing a library and utilizing regression for measurement processing | Raphael Jean Michel Marie Getin, Meng Cao, Leonid Poslavsky, Torsten R. Kaack, Hong Qiu | 2019-01-29 |
| 9412673 | Multi-model metrology | In-Kyo Kim, Xin Li, Leonid Poslavsky, Meng Cao, Sungchul Yoo +2 more | 2016-08-09 |