AS

Andrei V. Shchegrov

KL Kla-Tencor: 68 patents #3 of 1,394Top 1%
KL Kla: 18 patents #6 of 758Top 1%
SP Spectralus: 6 patents #2 of 4Top 50%
NO Novalux: 3 patents #2 of 17Top 15%
KL Kla-Tenor: 1 patents #2 of 33Top 7%
📍 Campbell, CA: #29 of 2,187 inventorsTop 2%
🗺 California: #2,363 of 386,348 inventorsTop 1%
Overall (All Time): #15,411 of 4,157,543Top 1%
97
Patents All Time

Issued Patents All Time

Showing 26–50 of 97 patents

Patent #TitleCo-InventorsDate
10804167 Methods and systems for co-located metrology David Y. Wang, Esen Salcin, Michael Friedmann, Derrick Shaughnessy, Jonathan M. Madsen +1 more 2020-10-13
10801953 Semiconductor metrology based on hyperspectral imaging David Y. Wang, Alexander Buettner, Stilian Ivanov Pandev, Emanuel Saerchen, Barry Blasenheim 2020-10-13
10769320 Integrated use of model-based metrology and a process model Alexander Kuznetsov, Stilian Ivanov Pandev 2020-09-08
10767978 Transmission small-angle X-ray scattering metrology system Antonio Arion Gellineau, Sergey Zalubovsky 2020-09-08
10732516 Process robust overlay metrology based on optical scatterometry Stilian Ivanov Pandev, Wei Lu 2020-08-04
10712145 Hybrid metrology for patterned wafer characterization Boxue Chen, Andrei Veldman, Alexander Kuznetsov 2020-07-14
10648796 Optical metrology with small illumination spot size Noam Sapiens, Kevin Peterlinz, Alexander Buettner, Kerstin Purrucker 2020-05-12
10612916 Measurement of multiple patterning parameters Shankar Krishnan, Kevin Peterlinz, Thaddeus Gerard Dziura, Noam Sapiens, Stilian Ivanov Pandev 2020-04-07
10545104 Computationally efficient X-ray based overlay measurement John J. Hench, Michael S. Bakeman 2020-01-28
10533848 Metrology and control of overlay and edge placement errors Frank Laske, Nadav Gutman 2020-01-14
10502694 Methods and apparatus for patterned wafer characterization Thaddeus Gerard Dziura, Stilian Ivanov Pandev, Alexander Kuznetsov 2019-12-10
10504759 Semiconductor metrology with information from multiple processing steps Alexander Kuznetsov, Antonio Arion Gellineau 2019-12-10
10490462 Metrology systems and methods for process control Stilian Ivanov Pandev, Dzmitry Sanko 2019-11-26
10458912 Model based optical measurements of semiconductor structures with anisotropic dielectric permittivity Houssam Chouaib, Qiang Zhao, Zhengquan Tan 2019-10-29
10438825 Spectral reflectometry for in-situ process monitoring and control Prateek Jain, Daniel Wack, Kevin Peterlinz, Shankar Krishnan 2019-10-08
10401738 Overlay metrology using multiple parameter configurations Andrew V. Hill, Amnon Manassen, Noam Sapiens 2019-09-03
10352876 Signal response metrology for scatterometry based overlay measurements Stilian Ivanov Pandev, Jonathan M. Madsen, Alexander Kuznetsov, Walter D. Mieher 2019-07-16
10352695 X-ray scatterometry metrology for high aspect ratio structures Thaddeus Gerard Dziura, Antonio Arion Gellineau 2019-07-16
10345095 Model based measurement systems with improved electromagnetic solver performance Stilian Ivanov Pandev, Leonid Poslavsky, Dzmitry Sanko 2019-07-09
10324050 Measurement system optimization for X-ray based metrology John J. Hench, Michael S. Bakeman 2019-06-18
10215688 Optical metrology tool equipped with modulated illumination sources Lawrence D. Rotter, David Y. Wang, Andrei Veldman, Kevin Peterlinz, Gregory Brady +1 more 2019-02-26
10203247 Systems for providing illumination in optical metrology Gregory Brady, Lawrence D. Rotter, Derrick Shaughnessy, Anatoly Shchemelinin, Ilya Bezel +16 more 2019-02-12
10151986 Signal response metrology based on measurements of proxy structures Thaddeus Gerard Dziura, Stilian Ivanov Pandev, Leonid Poslavsky 2018-12-11
10152678 System, method and computer program product for combining raw data from multiple metrology tools Stilian Ivanov Pandev, Thaddeus Gerard Dziura 2018-12-11
10139352 Measurement of small box size targets Stilian Ivanov Pandev, Wei Lu, Pablo I. Rovira, Jonathan M. Madsen 2018-11-27