| 12092966 |
Device feature specific edge placement error (EPE) |
Amnon Manassen, Nadav Gutman, Andrei V. Shchegrov |
2024-09-17 |
| 12085385 |
Design-assisted large field of view metrology |
Stefan Eyring |
2024-09-10 |
| 11637030 |
Multi-stage, multi-zone substrate positioning systems |
Yoram Uziel, Ulrich Pohlmann, Nadav Gutman, Ariel Hildesheim, Aviv Balan |
2023-04-25 |
| 10533848 |
Metrology and control of overlay and edge placement errors |
Andrei V. Shchegrov, Nadav Gutman |
2020-01-14 |
| 10474040 |
Systems and methods for device-correlated overlay metrology |
Ulrich Pohlmann, Stefan Eyring, Nadav Gutman |
2019-11-12 |
| 10473460 |
Overlay measurements of overlapping target structures based on symmetry of scanning electron beam signals |
Nadav Gutman, Eran Amit, Stefan Eyring, Hari Pathangi, Ulrich Pohlmann +1 more |
2019-11-12 |
| 10337852 |
Method for measuring positions of structures on a substrate and computer program product for determining positions of structures on a substrate |
Oliver Ache |
2019-07-02 |
| 10303153 |
Method and computer program product for controlling the positioning of patterns on a substrate in a manufacturing process |
Slawomir Czerkas |
2019-05-28 |
| 10185800 |
Apparatus and method for the measurement of pattern placement and size of pattern and computer program therefor |
Stefan Eyring |
2019-01-22 |
| 10141156 |
Measurement of overlay and edge placement errors with an electron beam column array |
Mark A. Neil |
2018-11-27 |
| 9892885 |
System and method for drift compensation on an electron beam based characterization tool |
Christopher Sears |
2018-02-13 |
| 9704238 |
Method for correcting position measurements for optical errors and method for determining mask writer errors |
Stefan Eyring, Oliver Ache |
2017-07-11 |
| 9424636 |
Method for measuring positions of structures on a mask and thereby determining mask manufacturing errors |
Mohammad Mehdi Daneshpanah, Slawomir Czerkas, Mark Wagner |
2016-08-23 |
| 9201312 |
Method for correcting position measurements for optical errors and method for determining mask writer errors |
Stefan Eyring, Oliver Ache |
2015-12-01 |
| 8804137 |
Unique mark and method to determine critical dimension uniformity and registration of reticles combined with wafer overlay capability |
DongSub Choi, Amir Widmann, Zain Saidin, John Robinson |
2014-08-12 |
| 8352886 |
Method for the reproducible determination of the position of structures on a mask with a pellicle frame |
Christian Enkrich, Eric Cotte |
2013-01-08 |
| 7864319 |
Device and method for determining an optical property of a mask |
Hans-Artur Boesser, Michael Heiden, Klaus Rinn |
2011-01-04 |