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Design-assisted large field of view metrology |
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Overlay mark design for electron beam overlay |
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| 11894214 |
Detection and correction of system responses in real-time |
Henning Stoschus, Christopher T. Sears |
2024-02-06 |
| 11862524 |
Overlay mark design for electron beam overlay |
Inna Steely-Tarshish, Mark Ghinovker, Yoel Feler, Eitan Hajaj, Ulrich Pohlmann +4 more |
2024-01-02 |
| 11720031 |
Overlay design for electron beam and scatterometry overlay measurements |
Inna Steely-Tarshish, Mark Ghinovker, Yoel Feler, Eitan Hajaj, Ulrich Pohlmann +4 more |
2023-08-08 |
| 11703767 |
Overlay mark design for electron beam overlay |
Inna Steely-Tarshish, Mark Ghinovker, Yoel Feier, Eitan Hajaj, Ulrich Pohlmann +4 more |
2023-07-18 |
| 11508551 |
Detection and correction of system responses in real-time |
Henning Stoschus, Christopher T. Sears |
2022-11-22 |
| 11481922 |
Online navigational drift correction for metrology measurements |
— |
2022-10-25 |
| 11209737 |
Performance optimized scanning sequence for eBeam metrology and inspection |
Henning Stoschus, Ulrich Pohlmann, Inna Steely-Tarshish, Nadav Gutman |
2021-12-28 |
| 10473460 |
Overlay measurements of overlapping target structures based on symmetry of scanning electron beam signals |
Nadav Gutman, Eran Amit, Hari Pathangi, Frank Laske, Ulrich Pohlmann +1 more |
2019-11-12 |
| 10474040 |
Systems and methods for device-correlated overlay metrology |
Frank Laske, Ulrich Pohlmann, Nadav Gutman |
2019-11-12 |
| 10185800 |
Apparatus and method for the measurement of pattern placement and size of pattern and computer program therefor |
Frank Laske |
2019-01-22 |
| 9704238 |
Method for correcting position measurements for optical errors and method for determining mask writer errors |
Oliver Ache, Frank Laske |
2017-07-11 |
| 9201312 |
Method for correcting position measurements for optical errors and method for determining mask writer errors |
Oliver Ache, Frank Laske |
2015-12-01 |