Issued Patents All Time
Showing 1–25 of 34 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 12347706 | Method for measuring and correcting misregistration between layers in a semiconductor device, and misregistration targets useful therein | Roie Volkovich, Renan Milo, Liran Yerushalmi, Moran Zaberchik, David Izraeli | 2025-07-01 |
| 12204254 | Multi-layered moiré targets and methods for using the same in measuring misregistration of semiconductor devices | Mark Ghinovker | 2025-01-21 |
| 12105433 | Imaging overlay targets using moiré elements and rotational symmetry arrangements | Mark Ghinovker, Diana Shaphirov, Evgeni Gurevich, Vladimir Levinski | 2024-10-01 |
| 12094100 | Measurement of stitching error using split targets | Mark Ghinovker | 2024-09-17 |
| 12055859 | Overlay mark design for electron beam overlay | Inna Steely-Tarshish, Stefan Eyring, Mark Ghinovker, Eitan Hajaj, Ulrich Pohlmann +4 more | 2024-08-06 |
| 12013634 | Reduction or elimination of pattern placement error in metrology measurements | Vladimir Levinski, Roel Gronheid, Sharon Aharon, Evgeni Gurevich, Anna Golotsvan +1 more | 2024-06-18 |
| 11862524 | Overlay mark design for electron beam overlay | Inna Steely-Tarshish, Stefan Eyring, Mark Ghinovker, Eitan Hajaj, Ulrich Pohlmann +4 more | 2024-01-02 |
| 11862522 | Accuracy improvements in optical metrology | Barak Bringoltz, Evgeni Gurevich, Ido Adam, Dror Alumot, Yuval Lamhot +6 more | 2024-01-02 |
| 11774863 | Induced displacements for improved overlay error metrology | Mark Ghinovker | 2023-10-03 |
| 11720031 | Overlay design for electron beam and scatterometry overlay measurements | Inna Steely-Tarshish, Stefan Eyring, Mark Ghinovker, Eitan Hajaj, Ulrich Pohlmann +4 more | 2023-08-08 |
| 11686576 | Metrology target for one-dimensional measurement of periodic misregistration | Mark Ghinovker | 2023-06-27 |
| 11614692 | Self-Moire grating design for use in metrology | Vladimir Levinski | 2023-03-28 |
| 11604149 | Metrology methods and optical schemes for measurement of misregistration by using hatched target designs | — | 2023-03-14 |
| 11537043 | Reduction or elimination of pattern placement error in metrology measurements | Vladimir Levinski, Roel Gronheid, Sharon Aharon, Evgeni Gurevich, Anna Golotsvan +1 more | 2022-12-27 |
| 11302544 | Method for measuring and correcting misregistration between layers in a semiconductor device, and misregistration targets useful therein | Roie Volkovich, Renan Milo, Liran Yerushalmi, Moran Zaberchik, David Izraeli | 2022-04-12 |
| 11256177 | Imaging overlay targets using Moiré elements and rotational symmetry arrangements | Mark Ghinovker, Diana Shaphirov, Evgeni Gurevich, Vladimir Levinski | 2022-02-22 |
| 11182892 | Periodic semiconductor device misregistration metrology system and method | Detlef Michelsson | 2021-11-23 |
| 11164307 | Misregistration metrology by using fringe Moiré and optical Moiré effects | Mark Ghinovker, Evgeni Gurevich, Vladimir Levinski, Alexander Svizher | 2021-11-02 |
| 11137692 | Metrology targets and methods with oblique periodic structures | Mark Ghinovker, Alexander Svizher, Vladimir Levinski, Inna Tarshish-Shapir | 2021-10-05 |
| 11073768 | Metrology target for scanning metrology | Andrew V. Hill, Amnon Manassen, Gilad Laredo, Mark Ghinovker, Vladimir Levinski | 2021-07-27 |
| 10901325 | Determining the impacts of stochastic behavior on overlay metrology data | Evgeni Gurevich, Michael Adel, Roel Gronheid, Vladimir Levinski, Dana Klein +1 more | 2021-01-26 |
| 10831108 | Method of analyzing and utilizing landscapes to reduce or eliminate inaccuracy in overlay optical metrology | Tal Marciano, Barak Bringoltz, Evgeni Gurevich, Ido Adam, Ze'ev Lindenfeld +17 more | 2020-11-10 |
| 10824082 | Estimation of asymmetric aberrations | Vladimir Levinski | 2020-11-03 |
| 10754261 | Reticle optimization algorithms and optimal target design | Vladimir Levinski | 2020-08-25 |
| 10591406 | Symmetric target design in scatterometry overlay metrology | Barak Bringoltz, Daniel Kandel, Noam Sapiens, Paykin Irina, Alexander Svizher +4 more | 2020-03-17 |