Issued Patents All Time
Showing 26–34 of 34 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 10340196 | Method and system for selection of metrology targets for use in focus and dose applications | Roie Volkovich, Hiroyuki Kurita | 2019-07-02 |
| 10261014 | Near field metrology | Noam Sapiens, Joel Seligson, Vladimir Levinski, Daniel Kandel, Barak Bringoltz +2 more | 2019-04-16 |
| 10242290 | Method, system, and user interface for metrology target characterization | Inna Tarshish-Shapir, Anat Marchelli, Berta Dinu, Vladimir Levinski, Boris Efraty +4 more | 2019-03-26 |
| 10197922 | Focus metrology and targets which utilize transformations based on aerial images of the targets | Nadav Gutman, Vladimir Levinski, Oded Kaminsky | 2019-02-05 |
| 9934353 | Focus measurements using scatterometry metrology | Mohamed El Kodadi, Nuriel Amir, Roie Volkovich, Vladimir Levinski, Daniel Kandel +3 more | 2018-04-03 |
| 9841689 | Approach for model calibration used for focus and dose measurement | Vladimir Levinski, Daniel Kandel, Nadav Gutman | 2017-12-12 |
| 9739702 | Symmetric target design in scatterometry overlay metrology | Barak Bringoltz, Daniel Kandel, Noam Sapiens, Irina Paykin, Alexander Svizher +4 more | 2017-08-22 |
| 9581430 | Phase characterization of targets | Amnon Manassen, Ohad Bachar, Daria Negri, Boris Golovanevsky, Barak Bringoltz +8 more | 2017-02-28 |
| 9454072 | Method and system for providing a target design displaying high sensitivity to scanner focus change | Vladimir Levinski, Daniel Kandel | 2016-09-27 |