Issued Patents All Time
Showing 1–25 of 35 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 12393113 | Inter-step feedforward process control in the manufacture of semiconductor devices | Liran Yerushalmi, Renan Milo, Yoav Grauer, David Izraeli | 2025-08-19 |
| 12347706 | Method for measuring and correcting misregistration between layers in a semiconductor device, and misregistration targets useful therein | Renan Milo, Liran Yerushalmi, Moran Zaberchik, Yoel Feler, David Izraeli | 2025-07-01 |
| 12222199 | Systems and methods for measurement of misregistration and amelioration thereof | Nachshon Rothman, Yossi Simon, Anna Golotsvan, Vladimir Levinski, Nireekshan K. Reddy +3 more | 2025-02-11 |
| 11971664 | Reducing device overlay errors | Liran Yerushalmi | 2024-04-30 |
| 11862521 | Multiple-tool parameter set calibration and misregistration measurement system and method | Anna Golotsvan | 2024-01-02 |
| 11761969 | System and method for analyzing a sample with a dynamic recipe based on iterative experimentation and feedback | Renan Milo, Anna Golotsvan, Tal Yaziv, Nir BenDavid | 2023-09-19 |
| 11644419 | Measurement of properties of patterned photoresist | Liran Yerushalmi, Amnon Manassen, Yoram Uziel | 2023-05-09 |
| 11640117 | Selection of regions of interest for measurement of misregistration and amelioration thereof | Moran Zaberchik | 2023-05-02 |
| 11635682 | Systems and methods for feedforward process control in the manufacture of semiconductor devices | Liran Yerushalmi, Achiam Bar | 2023-04-25 |
| 11551980 | Dynamic amelioration of misregistration measurement | Anna Golotsvan, Eyal Abend | 2023-01-10 |
| 11532566 | Misregistration target having device-scaled features useful in measuring misregistration of semiconductor devices | Liran Yerushalmi, Raviv Yohanan, Mark Ghinovker | 2022-12-20 |
| 11467503 | Field-to-field corrections using overlay targets | Enna Leshinsky-Altshuller, Inna Tarshish-Shapir, Mark Ghinovker, Diana Shaphirov, Guy Ben Dov +1 more | 2022-10-11 |
| 11454894 | Systems and methods for scatterometric single-wavelength measurement of misregistration and amelioration thereof | Alon Yagil, Yuval Lamhot, Ohad Bachar, Martin Mayo, Tal Yaziv | 2022-09-27 |
| 11360398 | System and method for tilt calculation based on overlay metrology measurements | Paul MacDonald, Ady Levy, Jincheng Pei, Jinyan Song, Amnon Manassen | 2022-06-14 |
| 11355375 | Device-like overlay metrology targets displaying Moiré effects | Liran Yerushalmi, Raviv Yohanan, Mark Ghinovker | 2022-06-07 |
| 11353321 | Metrology system and method for measuring diagonal diffraction-based overlay targets | Ohad Bachar, Nadav Gutman | 2022-06-07 |
| 11353493 | Data-driven misregistration parameter configuration and measurement system and method | Shlomit Katz, Anna Golotsvan, Raviv Yohanan | 2022-06-07 |
| 11353799 | System and method for error reduction for metrology measurements | Liran Yerushalmi, Anna Golotsvan, Rawi Dirawi, Chen Dror, Nir BenDavid +3 more | 2022-06-07 |
| 11302544 | Method for measuring and correcting misregistration between layers in a semiconductor device, and misregistration targets useful therein | Renan Milo, Liran Yerushalmi, Moran Zaberchik, Yoel Feler, David Izraeli | 2022-04-12 |
| 11226566 | Method of measuring misregistration of semiconductor devices | Ido Dolev | 2022-01-18 |
| 11075126 | Misregistration measurements using combined optical and electron beam technology | Liran Yerushalmi, Nadav Gutman | 2021-07-27 |
| 11060845 | Polarization measurements of metrology targets and corresponding target designs | Eran Amit, Barry Loevsky, Andrew V. Hill, Amnon Manassen, Nuriel Amir +1 more | 2021-07-13 |
| 11018064 | Multiple-tool parameter set configuration and misregistration measurement system and method | Eitan Herzel | 2021-05-25 |
| 10990022 | Field-to-field corrections using overlay targets | Enna Leshinsky-Altshuller, Inna Tarshish-Shapir, Mark Ghinovker, Diana Shaphirov, Guy Ben Dov +1 more | 2021-04-27 |
| 10962951 | Process and metrology control, process indicators and root cause analysis tools based on landscape information | Yaniv Abramovitz | 2021-03-30 |