Issued Patents All Time
Showing 25 most recent of 32 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 12117347 | Metrology target design for tilted device designs | Myungjun Lee, Mark D. Smith, Michael Adel, Daniel Kandel | 2024-10-15 |
| 11756687 | Method and system for assessing performance | Yoav Wegrzyn, Hilit MAAYAN, Eyal Drori, Steve Barrett, Amir Zviran | 2023-09-12 |
| 11709433 | Device-like metrology targets | Vladimir Levinski, Amnon Manassen, Nuriel Amir, Liran Yerushalmi, Amit Shaked | 2023-07-25 |
| 11372340 | Method and system for providing a quality metric for improved process control | Daniel Kandel, Guy M. Cohen, Dana Klein, Vladimir Levinski, Noam Sapiens +3 more | 2022-06-28 |
| 11248905 | Machine learning in metrology measurements | — | 2022-02-15 |
| 11158548 | Overlay measurement using multiple wavelengths | Yuval Lamhot, Einat Peled, Noga Sella, Wei-Te Cheng, Ido Adam | 2021-10-26 |
| 11119417 | Single cell grey scatterometry overlay targets and their measurement using varying illumination parameter(s) | Amnon Manassen, Yuri Paskover | 2021-09-14 |
| 11085754 | Enhancing metrology target information content | Amnon Manassen, Nadav Gutman | 2021-08-10 |
| 11067904 | System for combined imaging and scatterometry metrology | Raviv Yohanan | 2021-07-20 |
| 11060845 | Polarization measurements of metrology targets and corresponding target designs | Barry Loevsky, Andrew V. Hill, Amnon Manassen, Nuriel Amir, Vladimir Levinski +1 more | 2021-07-13 |
| 11054752 | Device metrology targets and methods | Daniel Kandel, Dror Alumot, Amit Shaked, Liran Yerushalmi | 2021-07-06 |
| 11006860 | Method and apparatus for gait analysis | Shai Rosenblit, Amir Zviran, Steve Barrett, Moran Gad | 2021-05-18 |
| 10763146 | Recipe optimization based zonal analysis | Roie Volkovich, Michael Adel, Liran Yerushalmi, Eitan Herzel, Mengmeng Ye | 2020-09-01 |
| 10699969 | Quick adjustment of metrology measurement parameters according to process variation | Einat Peled, Alexander Svizher, Yuval Lamhot, Noga Sella, Wei-Te Cheng | 2020-06-30 |
| 10685165 | Metrology using overlay and yield critical patterns | Daniel Kandel, Mark D. Smith, Mark Wagner, Myungjun Lee | 2020-06-16 |
| 10622238 | Overlay measurement using phase and amplitude modeling | Nadav Gutman, Moran Zaberchik | 2020-04-14 |
| 10571811 | Device metrology targets and methods | Daniel Kandel, Dror Alumot, Amit Shaked, Liran Yerushalmi | 2020-02-25 |
| 10551749 | Metrology targets with supplementary structures in an intermediate layer | Vladimir Levinski, Amnon Manassen, Nuriel Amir, Liran Yerushalmi, Amit Shaked | 2020-02-04 |
| 10527951 | Compound imaging metrology targets | Raviv Yohanan, Mark Ghinovker, Tal Itzkovich, Nuriel Amir | 2020-01-07 |
| 10504802 | Target location in semiconductor manufacturing | Naomi Ittah, Nadav Gutman, Vincent Immer, Einat Peled | 2019-12-10 |
| 10473460 | Overlay measurements of overlapping target structures based on symmetry of scanning electron beam signals | Nadav Gutman, Stefan Eyring, Hari Pathangi, Frank Laske, Ulrich Pohlmann +1 more | 2019-11-12 |
| 10458777 | Polarization measurements of metrology targets and corresponding target designs | Barry Loevsky, Andrew V. Hill, Amnon Manassen, Nuriel Amir, Vladimir Levinski +1 more | 2019-10-29 |
| 10415963 | Estimating and eliminating inter-cell process variation inaccuracy | Tal Marciano, Barak Bringoltz, Nuriel Amir, Amit Shaked | 2019-09-17 |
| 10401841 | Identifying registration errors of DSA lines | Roie Volkovich, Raviv Yohanan | 2019-09-03 |
| 10365230 | Scatterometry overlay based on reflection peak locations | Tzahi Grunzweig | 2019-07-30 |