Issued Patents All Time
Showing 25 most recent of 27 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 12321102 | Machine and deep learning methods for spectra-based metrology and process control | Ran YACOBY, Noam Tal, Shay Yogev, Boaz STURLESI, Oded Cohen | 2025-06-03 |
| 12236364 | Metrology and process control for semiconductor manufacturing | EITAN ROTHSTEIN, Ilya Rubinovich, Noam Tal, Yongha Kim, ARIEL BROITMAN +5 more | 2025-02-25 |
| 12038271 | Detecting outliers and anomalies for OCD metrology machine learning | EITAN ROTHSTEIN, Yongha Kim, Ilya Rubinovich, ARIEL BROITMAN, OLGA KRASNYKOV | 2024-07-16 |
| 11874606 | System and method for controlling measurements of sample's parameters | Ofer SHLAGMAN, Ran YACOBY, Noam Tal | 2024-01-16 |
| 11862522 | Accuracy improvements in optical metrology | Evgeni Gurevich, Ido Adam, Yoel Feler, Dror Alumot, Yuval Lamhot +6 more | 2024-01-02 |
| 11815819 | Machine and deep learning methods for spectra-based metrology and process control | Ran YACOBY, Noam Tal, Shay Yogev, Boaz STURLESI, Oded Cohen | 2023-11-14 |
| 11763181 | Metrology and process control for semiconductor manufacturing | EITAN ROTHSTEIN, Ilya Rubinovich, Noam Tal, Yongha Kim, ARIEL BROITMAN +5 more | 2023-09-19 |
| 11093840 | Metrology and process control for semiconductor manufacturing | EITAN ROTHSTEIN, Ilya Rubinovich, Noam Tal, Yongha Kim, ARIEL BROITMAN +5 more | 2021-08-17 |
| 10831108 | Method of analyzing and utilizing landscapes to reduce or eliminate inaccuracy in overlay optical metrology | Tal Marciano, Evgeni Gurevich, Ido Adam, Ze'ev Lindenfeld, Zeng Zhao +17 more | 2020-11-10 |
| 10591406 | Symmetric target design in scatterometry overlay metrology | Daniel Kandel, Yoel Feler, Noam Sapiens, Paykin Irina, Alexander Svizher +4 more | 2020-03-17 |
| 10533940 | Scanning in angle-resolved reflectometry and algorithmically eliminating diffraction from optical metrology | Amnon Manassen, Andrew V. Hill, Daniel Kandel, Ilan Sela, Ohad Bachar | 2020-01-14 |
| 10415963 | Estimating and eliminating inter-cell process variation inaccuracy | Tal Marciano, Eran Amit, Nuriel Amir, Amit Shaked | 2019-09-17 |
| 10261014 | Near field metrology | Noam Sapiens, Joel Seligson, Vladimir Levinski, Daniel Kandel, Yoel Feler +2 more | 2019-04-16 |
| 10234280 | Reflection symmetric scatterometry overlay targets and methods | Daniel Kandel | 2019-03-19 |
| 10203200 | Analyzing root causes of process variation in scatterometry metrology | Tal Marciano, Michael Adel, Mark Ghinovker, Dana Klein, Tal Itzkovich +2 more | 2019-02-12 |
| 10126238 | Scanning in angle-resolved reflectometry and algorithmically eliminating diffraction from optical metrology | Amnon Manassen, Andrew V. Hill, Daniel Kandel, Ilan Sela, Ohad Bachar | 2018-11-13 |
| 9958385 | Scanning in angle-resolved reflectometry and algorithmically eliminating diffraction from optical metrology | Amnon Manassen, Andrew V. Hill, Daniel Kandel, Ilan Sela, Ohad Bachar | 2018-05-01 |
| 9909982 | Pupil plane calibration for scatterometry overlay measurement | Irina Vakshtein, Ofir Aharon, Guy Ben Dov, Zeev Bomzon | 2018-03-06 |
| 9903711 | Feed forward of metrology data in a metrology system | Ady Levy, Daniel Kandel, Michael Adel, Leonid Poslavsky, John Robinson +9 more | 2018-02-27 |
| 9874527 | Removing process-variation-related inaccuracies from scatterometry measurements | Eran Amit, Zeev Bomzon, Boris Efraty | 2018-01-23 |
| 9869543 | Reducing algorithmic inaccuracy in scatterometry overlay metrology | Mark Ghinovker, Daniel Kandel, Vladimir Levinski, Zeev Bomzon | 2018-01-16 |
| 9851300 | Decreasing inaccuracy due to non-periodic effects on scatterometric signals | Ofer Zaharan, Amnon Manassen, Nadav Carmel, Victoria Naipak, Alexander Svizher +2 more | 2017-12-26 |
| 9784987 | Apodization for pupil imaging scatterometry | Andrew V. Hill, Amnon Manassen, Ohad Bachar, Mark Ghinovker, Zeev Bomzon +1 more | 2017-10-10 |
| 9739702 | Symmetric target design in scatterometry overlay metrology | Daniel Kandel, Yoel Feler, Noam Sapiens, Irina Paykin, Alexander Svizher +4 more | 2017-08-22 |
| 9726984 | Aperture alignment in scatterometry metrology systems | Nadav Carmel | 2017-08-08 |