Issued Patents All Time
Showing 1–8 of 8 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 12105433 | Imaging overlay targets using moiré elements and rotational symmetry arrangements | Yoel Feler, Mark Ghinovker, Diana Shaphirov, Vladimir Levinski | 2024-10-01 |
| 12013634 | Reduction or elimination of pattern placement error in metrology measurements | Yoel Feler, Vladimir Levinski, Roel Gronheid, Sharon Aharon, Anna Golotsvan +1 more | 2024-06-18 |
| 11862522 | Accuracy improvements in optical metrology | Barak Bringoltz, Ido Adam, Yoel Feler, Dror Alumot, Yuval Lamhot +6 more | 2024-01-02 |
| 11537043 | Reduction or elimination of pattern placement error in metrology measurements | Yoel Feler, Vladimir Levinski, Roel Gronheid, Sharon Aharon, Anna Golotsvan +1 more | 2022-12-27 |
| 11256177 | Imaging overlay targets using Moiré elements and rotational symmetry arrangements | Yoel Feler, Mark Ghinovker, Diana Shaphirov, Vladimir Levinski | 2022-02-22 |
| 11164307 | Misregistration metrology by using fringe Moiré and optical Moiré effects | Yoel Feler, Mark Ghinovker, Vladimir Levinski, Alexander Svizher | 2021-11-02 |
| 10901325 | Determining the impacts of stochastic behavior on overlay metrology data | Michael Adel, Roel Gronheid, Yoel Feler, Vladimir Levinski, Dana Klein +1 more | 2021-01-26 |
| 10831108 | Method of analyzing and utilizing landscapes to reduce or eliminate inaccuracy in overlay optical metrology | Tal Marciano, Barak Bringoltz, Ido Adam, Ze'ev Lindenfeld, Zeng Zhao +17 more | 2020-11-10 |