| 12197137 |
System and method for determining post bonding overlay |
Franz Zach, Xiaomeng Shen, Jason Saito, David Owen |
2025-01-14 |
|
| 12164277 |
System and method for mitigating overlay distortion patterns caused by a wafer bonding tool |
Franz Zach, Roel Gronheid |
2024-12-10 |
$188,249,000 |
| 12117347 |
Metrology target design for tilted device designs |
Myungjun Lee, Michael Adel, Eran Amit, Daniel Kandel |
2024-10-15 |
$650,175,000 |
| 11829077 |
System and method for determining post bonding overlay |
Franz Zach, Xiaomeng Shen, Jason Saito, David Owen |
2023-11-28 |
$159,060,000 |
| 11782411 |
System and method for mitigating overlay distortion patterns caused by a wafer bonding tool |
Franz Zach, Roel Gronheid |
2023-10-10 |
$126,057,000 |
| 11682570 |
Process-induced displacement characterization during semiconductor production |
Pradeep Vukkadala, Ady Levy, Prasanna Dighe, Dieter Mueller |
2023-06-20 |
$468,350,000 |
| 11221561 |
System and method for wafer-by-wafer overlay feedforward and lot-to-lot feedback control |
Onur N. Demirer, Fatima Anis |
2022-01-11 |
$171,362,000 |
| 11164768 |
Process-induced displacement characterization during semiconductor production |
Pradeep Vukkadala, Ady Levy, Prasanna Dighe, Dieter Mueller |
2021-11-02 |
$252,368,000 |
| 10685165 |
Metrology using overlay and yield critical patterns |
Daniel Kandel, Mark Wagner, Eran Amit, Myungjun Lee |
2020-06-16 |
|
| 10579768 |
Process compatibility improvement by fill factor modulation |
Vladimir Levinski, Eitan Hajaj, Tal Itzkovich, Sharon Aharon, Michael Adel +5 more |
2020-03-03 |
|
| 10496781 |
Metrology recipe generation using predicted metrology images |
Chao Fang, Brian Duffy |
2019-12-03 |
$155,666,000 |
| 10475712 |
System and method for process-induced distortion prediction during wafer deposition |
Ady Levy |
2019-11-12 |
|
| 10444639 |
Layer-to-layer feedforward overlay control with alignment corrections |
Onur N. Demirer, William Pierson, Jeremy Nabeth, Miguel Garcia-Medina, Lipkong Yap |
2019-10-15 |
|
| 10340165 |
Systems and methods for automated multi-zone detection and modeling |
Jeremy Nabeth, Onur N. Demirer, Ramkumar Karur-Shanmugam, Choon (George) Hoong Hoo, Christian Sparka +4 more |
2019-07-02 |
|
| 10216096 |
Process-sensitive metrology systems and methods |
Myungjun Lee, Sanjay Kapasi, Stilian Ivanov Pandev, Dzmitry Sanko, Pradeep Subrahmanyan +1 more |
2019-02-26 |
|
| 10209627 |
Systems and methods for focus-sensitive metrology targets |
Myungjun Lee, Stewart Robertson, Pradeep Subrahmanyan |
2019-02-19 |
|
| 10095122 |
Systems and methods for fabricating metrology targets with sub-resolution features |
Myungjun Lee |
2018-10-09 |
|
| 10030965 |
Model-based hot spot monitoring |
Stilian Ivanov Pandev, Sanjay Kapasi, Ady Levy |
2018-07-24 |
|
| 10024654 |
Method and system for determining in-plane distortions in a substrate |
Jose Solomon, Stuart Sherwin, Walter D. Mieher, Ady Levy |
2018-07-17 |
|
| 10018919 |
System and method for fabricating metrology targets oriented with an angle rotated with respect to device features |
Myungjun Lee |
2018-07-10 |
|
| 10007191 |
Method for computer modeling and simulation of negative-tone-developable photoresists |
John Biafore, John S. Graves, David Blankenship, Alessandro Vaglio Pret |
2018-06-26 |
|
| 9733576 |
Model for accurate photoresist profile prediction |
John Biafore |
2017-08-15 |
|
| 9679116 |
Photoresist simulation |
John Biafore, John S. Graves, David Blankenship |
2017-06-13 |
|
| 8589827 |
Photoresist simulation |
John Biafore, John S. Graves, David Blankenship |
2013-11-19 |
$51,759,000 |
| 8428762 |
Spin coating modeling |
John S. Graves, Stewart Robertson |
2013-04-23 |
$25,357,000 |
