Issued Patents All Time
Showing 25 most recent of 27 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 12197137 | System and method for determining post bonding overlay | Franz Zach, Xiaomeng Shen, Jason Saito, David Owen | 2025-01-14 |
| 12164277 | System and method for mitigating overlay distortion patterns caused by a wafer bonding tool | Franz Zach, Roel Gronheid | 2024-12-10 |
| 12117347 | Metrology target design for tilted device designs | Myungjun Lee, Michael Adel, Eran Amit, Daniel Kandel | 2024-10-15 |
| 11829077 | System and method for determining post bonding overlay | Franz Zach, Xiaomeng Shen, Jason Saito, David Owen | 2023-11-28 |
| 11782411 | System and method for mitigating overlay distortion patterns caused by a wafer bonding tool | Franz Zach, Roel Gronheid | 2023-10-10 |
| 11682570 | Process-induced displacement characterization during semiconductor production | Pradeep Vukkadala, Ady Levy, Prasanna Dighe, Dieter Mueller | 2023-06-20 |
| 11221561 | System and method for wafer-by-wafer overlay feedforward and lot-to-lot feedback control | Onur N. Demirer, Fatima Anis | 2022-01-11 |
| 11164768 | Process-induced displacement characterization during semiconductor production | Pradeep Vukkadala, Ady Levy, Prasanna Dighe, Dieter Mueller | 2021-11-02 |
| 10685165 | Metrology using overlay and yield critical patterns | Daniel Kandel, Mark Wagner, Eran Amit, Myungjun Lee | 2020-06-16 |
| 10579768 | Process compatibility improvement by fill factor modulation | Vladimir Levinski, Eitan Hajaj, Tal Itzkovich, Sharon Aharon, Michael Adel +5 more | 2020-03-03 |
| 10496781 | Metrology recipe generation using predicted metrology images | Chao Fang, Brian Duffy | 2019-12-03 |
| 10475712 | System and method for process-induced distortion prediction during wafer deposition | Ady Levy | 2019-11-12 |
| 10444639 | Layer-to-layer feedforward overlay control with alignment corrections | Onur N. Demirer, William Pierson, Jeremy Nabeth, Miguel Garcia-Medina, Lipkong Yap | 2019-10-15 |
| 10340165 | Systems and methods for automated multi-zone detection and modeling | Jeremy Nabeth, Onur N. Demirer, Ramkumar Karur-Shanmugam, Choon (George) Hoong Hoo, Christian Sparka +4 more | 2019-07-02 |
| 10216096 | Process-sensitive metrology systems and methods | Myungjun Lee, Sanjay Kapasi, Stilian Ivanov Pandev, Dzmitry Sanko, Pradeep Subrahmanyan +1 more | 2019-02-26 |
| 10209627 | Systems and methods for focus-sensitive metrology targets | Myungjun Lee, Stewart Robertson, Pradeep Subrahmanyan | 2019-02-19 |
| 10095122 | Systems and methods for fabricating metrology targets with sub-resolution features | Myungjun Lee | 2018-10-09 |
| 10030965 | Model-based hot spot monitoring | Stilian Ivanov Pandev, Sanjay Kapasi, Ady Levy | 2018-07-24 |
| 10024654 | Method and system for determining in-plane distortions in a substrate | Jose Solomon, Stuart Sherwin, Walter D. Mieher, Ady Levy | 2018-07-17 |
| 10018919 | System and method for fabricating metrology targets oriented with an angle rotated with respect to device features | Myungjun Lee | 2018-07-10 |
| 10007191 | Method for computer modeling and simulation of negative-tone-developable photoresists | John Biafore, John S. Graves, David Blankenship, Alessandro Vaglio Pret | 2018-06-26 |
| 9733576 | Model for accurate photoresist profile prediction | John Biafore | 2017-08-15 |
| 9679116 | Photoresist simulation | John Biafore, John S. Graves, David Blankenship | 2017-06-13 |
| 8589827 | Photoresist simulation | John Biafore, John S. Graves, David Blankenship | 2013-11-19 |
| 8428762 | Spin coating modeling | John S. Graves, Stewart Robertson | 2013-04-23 |