Issued Patents All Time
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 12406197 | Prediction and metrology of stochastic photoresist thickness defects | Anatoly Burov, Guy Parsey, Kunlun Bai, Pradeep Vukkadala, Cao Zhang +2 more | 2025-09-02 |
| 11966156 | Lithography mask repair by simulation of photoresist thickness evolution | Pradeep Vukkadala, Guy Parsey, Kunlun Bai, Xiaohan Li, Anatoly Burov +2 more | 2024-04-23 |
| 10007191 | Method for computer modeling and simulation of negative-tone-developable photoresists | John Biafore, Mark D. Smith, David Blankenship, Alessandro Vaglio Pret | 2018-06-26 |
| 9679116 | Photoresist simulation | John Biafore, Mark D. Smith, David Blankenship | 2017-06-13 |
| 8589827 | Photoresist simulation | John Biafore, Mark D. Smith, David Blankenship | 2013-11-19 |
| 8428762 | Spin coating modeling | Mark D. Smith, Stewart Robertson | 2013-04-23 |