| 12379669 |
Massive overlay metrology sampling with multiple measurement columns |
Jonathan M. Madsen, Andrei V. Shchegrov, Amnon Manassen, Andrew V. Hill, Yossi Simon +1 more |
2025-08-05 |
| 11933717 |
Sensitive optical metrology in scanning and static modes |
Andrew V. Hill, Amnon Manassen, Yoram Uziel, Yossi Simon |
2024-03-19 |
| 11899375 |
Massive overlay metrology sampling with multiple measurement columns |
Jonathan M. Madsen, Andrei V. Shchegrov, Amnon Manassen, Andrew V. Hill, Yossi Simon +1 more |
2024-02-13 |
| 11880141 |
Method of measuring misregistration in the manufacture of topographic semiconductor device wafers |
Daria Negri, Amnon Manassen |
2024-01-23 |
| 11573497 |
System and method for measuring misregistration of semiconductor device wafers utilizing induced topography |
Daria Negri, Amnon Manassen |
2023-02-07 |
| 11512948 |
Imaging system for buried metrology targets |
Andrew V. Hill, Amnon Manassen, Avner Safrani |
2022-11-29 |
| 11346657 |
Measurement modes for overlay |
Amnon Manassen, Andrew V. Hill |
2022-05-31 |
| 11333616 |
Adaptive focusing system for a scanning metrology tool |
— |
2022-05-17 |
| 11281111 |
Off-axis illumination overlay measurement using two-diffracted orders imaging |
Yoni Shalibo, Yuri Paskover, Vladimir Levinski, Amnon Manassen, Shlomo Eisenbach +1 more |
2022-03-22 |
| 11281112 |
Method of measuring misregistration in the manufacture of topographic semiconductor device wafers |
Daria Negri, Amnon Manassen |
2022-03-22 |
| 11073768 |
Metrology target for scanning metrology |
Andrew V. Hill, Amnon Manassen, Yoel Feler, Mark Ghinovker, Vladimir Levinski |
2021-07-27 |