| 11513085 |
Measurement and control of wafer tilt for x-ray based metrology |
Joseph A. Di Regolo, Yan Zhang, Robert Press, Huy D. Nguyen |
2022-11-29 |
| 11268901 |
Variable aperture mask |
Noam Sapiens, Michael Friedmann, Pablo I. Rovira |
2022-03-08 |
| 10801953 |
Semiconductor metrology based on hyperspectral imaging |
David Y. Wang, Alexander Buettner, Stilian Ivanov Pandev, Emanuel Saerchen, Andrei V. Shchegrov |
2020-10-13 |
| 10739571 |
Lens design for spectroscopic ellipsometer or reflectometer |
— |
2020-08-11 |
| 10663392 |
Variable aperture mask |
Noam Sapiens, Michael Friedmann, Pablo I. Rovira |
2020-05-26 |
| 10365211 |
Systems and methods for metrology beam stabilization |
Noam Sapiens, Michael Friedmann |
2019-07-30 |
| 9243999 |
Ellipsometer focusing system |
Amit Shachaf |
2016-01-26 |
| 8638509 |
Optical camera alignment |
H. Pin Kao, Mark F. Oldham |
2014-01-28 |
| 8559008 |
Ellipsometer focusing system |
Amit Shachaf |
2013-10-15 |
| 8040619 |
Optical camera alignment |
H. Pin Kao, Mark F. Oldham |
2011-10-18 |
| 7570443 |
Optical camera alignment |
H. Pin Kao, Mark F. Oldham |
2009-08-04 |
| 7129505 |
Fluorescence detection instrument with reflective transfer legs for color decimation |
Clifford A. Oostman, Jr. |
2006-10-31 |
| 6683314 |
Fluorescence detection instrument with reflective transfer legs for color decimation |
Clifford A. Oostman, Jr. |
2004-01-27 |
| 6510007 |
Flow cytometry lens system |
— |
2003-01-21 |
