LL

Lie-Quan Lee

KL Kla-Tencor: 9 patents #162 of 1,394Top 15%
KL Kla: 3 patents #125 of 758Top 20%
TL Tokyo Electron Limited: 1 patents #3,538 of 5,567Top 65%
📍 Fremont, CA: #1,486 of 9,298 inventorsTop 20%
🗺 California: #50,852 of 386,348 inventorsTop 15%
Overall (All Time): #406,003 of 4,157,543Top 10%
12
Patents All Time

Issued Patents All Time

Showing 1–12 of 12 patents

Patent #TitleCo-InventorsDate
11562289 Loosely-coupled inspection and metrology system for high-volume production process monitoring Song Wu, Yin Xu, Andrei V. Shchegrov, Pablo I. Rovira, Jonathan M. Madsen 2023-01-24
11175589 Automatic wavelength or angle pruning for optical metrology Leonid Poslavsky 2021-11-16
10895810 Automatic selection of sample values for optical metrology Meng Cao, Leonid Poslavsky, Inkyo Kim 2021-01-19
10732520 Measurement library optimization in semiconductor metrology Meng Cao, Qiang Zhao, Heyin Li, Mengmeng Ye 2020-08-04
10502692 Automated metrology system selection Meng Cao, Qiang Zhao, Heyin Li, Mengmeng Ye 2019-12-10
10386729 Dynamic removal of correlation of highly correlated parameters for optical metrology Leonid Poslavsky, Stilian Ivanov Pandev 2019-08-20
10345721 Measurement library optimization in semiconductor metrology Meng Cao, Qiang Zhao, Heyin Li, Mengmeng Ye 2019-07-09
10255385 Model optimization approach based on spectral sensitivity Stilian Ivanov Pandev, Thaddeus Gerard Dziura, Meng-Fu Shih 2019-04-09
9607265 Accurate and fast neural network training for library-based critical dimension (CD) metrology Wen Jin, Vi Vuong, Junwei Bao, Leonid Poslavsky 2017-03-28
9553033 Semiconductor device models including re-usable sub-structures Jonathan Iloreta, Matthew A. Laffin, Leonid Poslavsky, Torsten R. Kaack, Qiang Zhao 2017-01-24
9347872 Meta-model based measurement refinement Leonid Poslavsky 2016-05-24
8577820 Accurate and fast neural network training for library-based critical dimension (CD) metrology Wen Jin, Vi Vuong, Junwei Bao, Leonid Poslavsky 2013-11-05