Issued Patents All Time
Showing 1–18 of 18 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 10605722 | Metrology system calibration refinement | Hidong Kwak, John Lesoine, Malik Sadiq, Shankar Krishnan, Leonid Poslavsky +1 more | 2020-03-31 |
| 9857291 | Metrology system calibration refinement | Hidong Kwak, John Lesoine, Malik Sadiq, Shankar Krishnan, Leonid Poslavsky +1 more | 2018-01-02 |
| 9470639 | Optical metrology with reduced sensitivity to grating anomalies | Guorong V. Zhuang, Shankar Krishnan, Walter D. Mieher, Paul Aoyagi | 2016-10-18 |
| 7342661 | Method for noise improvement in ellipsometers | Martin Ebert | 2008-03-11 |
| 7068370 | Optical inspection equipment for semiconductor wafers with precleaning | Allan Rosencwaig | 2006-06-27 |
| 7054006 | Self-calibrating beam profile ellipsometer | Haiming Wang, Jeffrey T. Fanton | 2006-05-30 |
| 6930771 | Optical inspection equipment for semiconductor wafers with precleaning | Allan Rosencwaig | 2005-08-16 |
| 6894781 | Monitoring temperature and sample characteristics using a rotating compensator ellipsometer | Jon Opsal, Allan Rosencwaig | 2005-05-17 |
| 6870621 | Small spot ellipsometer | — | 2005-03-22 |
| 6856385 | Spatial averaging technique for ellipsometry and reflectometry | Hanyou Chu, Jon Opsal | 2005-02-15 |
| 6738138 | Small spot ellipsometer | — | 2004-05-18 |
| 6714300 | Optical inspection equipment for semiconductor wafers with precleaning | Allan Rosencwaig | 2004-03-30 |
| 6608689 | Combination thin-film stress and thickness measurement device | Jon Opsal, Allan Rosencwaig | 2003-08-19 |
| 6583875 | Monitoring temperature and sample characteristics using a rotating compensator ellipsometer | Jon Opsal, Allan Rosencwaig | 2003-06-24 |
| 6577384 | Spatial averaging technique for ellipsometry and reflectometry | Hanyou Chu, Jon Opsal | 2003-06-10 |
| 6515744 | Small spot ellipsometer | — | 2003-02-04 |
| 6509199 | Spatial averaging technique for ellipsometry and reflectometry | — | 2003-01-21 |
| 6281027 | Spatial averaging technique for ellipsometry and reflectometry | Hanyou Chu, Jon Opsal | 2001-08-28 |